380V Three Phase Dry Vacuum Pump GRH1802 1800 M³/H
Price:
USD 12,000-18,000 / Set
MOQ:
1 Set
Delivery Time:
15-30 working days
Brand:
GRH
Product Description
GRH1802 Dry Vacuum Pump
The GRH1802 is an 1800 m³/h dry vacuum pump designed for demanding semiconductor and photovoltaic processes. With an oil-free pump chamber, compact footprint, and low energy consumption, it delivers reliable performance with robust dust handling capability.
Key Features
- Permanent Magnet Synchronous Motor — Delivers superior energy efficiency and lower power consumption compared to conventional induction motors.
- Advanced Rotor Structure — Enhanced dust extraction capability, making the pump highly tolerant to particulate-laden process gases.
- Dust and Water Vapor Tolerant — Insensitive to dust and water vapor entrained in the pumped gas stream.
- Compact and Integrated Design — Small footprint with high system integration for easy installation in crowded fab environments.
- Comprehensive Protection — Built-in protection functions with strong adaptive capability for varying process conditions.
- Low Vibration and Noise — Operates at ＜70 dB(A) at ultimate pressure for a quieter workplace.
- Advanced Sealing System — Lip seal and labyrinth seal combined with nitrogen purge effectively prevents oil back-streaming, ensuring high vacuum cleanliness in the process chamber.
- Remote Control and Monitoring — Supports I/O interface and RS485 communication (Modbus protocol) for seamless integration into factory automation systems.
Technical Specifications
| Parameter | Specification |
|---|---|
| Pumping Speed | 1800 m³/h |
| Ultimate Pressure | ≤0.5 Pa |
| Rated Power | 7.5+4.5 kW |
| Voltage | 380V Three-Phase |
| Cooling Water Pressure | 0.3-0.6 MPa |
| Cooling Water Flow | 6 L/min |
| Cooling Water Temperature | 10-30 °C |
| Cooling Water Connection | G3/8 |
| N2 Purge Pressure | 0.3-0.6 MPa |
| N2 Purge Flow | 4-96 L/min |
| N2 Purge Connection | G1/4 |
| Inlet Connection | ISO160 |
| Outlet Connection | KF40 |
| Noise Level | ＜70 dB(A) |
| Operating Environment | 5~40°C; ≤80% RH |
| Weight | 472 kg |
| Dimensions (L*W*H) | 935*420*795 mm |
Application Processes
Clean Processes
Load-Lock, Transfer, Metrology, Lithography
Medium Processes
PVD Process, PVD Pre-Clean, RTA, Strip/Ashing, Oxide Etch, Silicon Etch, Implant Source, Metal Etch
Harsh Processes
HDP-CVD, RTP, SACVD, MOCVD, PECVD, LPCVD, ALD
Target Industries
- Semiconductor: Etching, ion implantation, CVD, and other clean, medium, and harsh process applications.
- Photovoltaic: Crystal growth furnaces, cell manufacturing processes.
- Lithium Battery: Cell vacuum drying, electrolyte filling, and degassing processes.
- Flat Panel Display & LED: Manufacturing processes requiring high-cleanliness vacuum environments.
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Get in Touch
Have questions about our products or want to discuss a custom order? Our team is ready to help you.
Company
SUZHOU KACO VACUUM EQUIPMENT CO.,LTD.
Location
#3,No.152 Kangzhuang Rd,Zhoushi Town,Kunshan city,Suzhou,PRC.
Contact Person
Joyce