GRM1201 1200 M³/H ISO160 KF25 Dry Pump For Semiconductor PV
Price:
USD 13,000-20,000 / Set
MOQ:
1 Set
Delivery Time:
15-30 working days
Brand:
GRM
Product Description
GRM1201 Dry Vacuum Pump
The GRM1201 is a 1200 m³/h dry vacuum pump with low power consumption and high pumping speed for large exhaust volume applications. It handles flammable, explosive, and condensable process gases, designed for demanding PECVD, MOCVD, and SIC-CVD processes.
Key Features
- Permanent Magnet Synchronous Motor — Delivers superior energy efficiency with industry-leading low power consumption.
- Advanced Rotor Structure — Enhanced dust extraction capability ensures reliable operation in particulate-heavy process environments.
- Dust and Water Vapor Tolerant — Insensitive to dust and water vapor entrained in the pumped gas stream.
- Compact and Integrated Design — Small footprint with high system integration for easy installation in crowded fab environments.
- Comprehensive Protection — Built-in protection functions with strong adaptive capability for varying process conditions.
- Low Vibration and Noise — Operates at ≤63 dB(A) at ultimate pressure for a quieter workplace.
- Advanced Sealing System — Lip seal and labyrinth seal combined with nitrogen purge effectively prevents oil back-streaming, maintaining high vacuum cleanliness in the process chamber.
- Remote Control and Monitoring — Supports I/O interface and RS485 communication (Modbus protocol) for seamless integration into factory automation systems.
- Hazardous Gas Compatible — Safe operation with flammable, explosive, and condensable process gases.
Technical Specifications
| Parameter | Specification |
|---|---|
| Pumping Speed | 1200 m³/h |
| Ultimate Pressure | ≤0.15 Pa |
| Rated Power | 1.9+1.9 kW |
| Voltage | 380V Three-Phase |
| Cooling Water Pressure | 0.2-0.6 MPa |
| Cooling Water Flow | ≥4 L/min |
| Cooling Water Temperature | 5-30 °C |
| Cooling Water Connection | G3/8 |
| N2 Purge Pressure | 0.2-0.6 MPa |
| N2 Purge Flow | 12-50 L/min |
| N2 Purge Connection | G1/4 |
| Inlet Connection | ISO160 |
| Outlet Connection | KF25 |
| Noise Level | ≤63 dB(A) |
| Operating Environment | 5~40°C; ≤80% RH |
| Weight | 260 kg |
| Dimensions (L*W*H) | 865*344*751 mm |
Application Processes
Clean Processes
Load-Lock, Transfer, Metrology, Lithography
Medium Processes
PVD Process, PVD Pre-Clean, RTA, Strip/Ashing, Oxide Etch, Silicon Etch, Implant Source, Metal Etch
Harsh Processes
HDP-CVD, RTP, SACVD, MOCVD, PECVD, LPCVD, ALD
Target Industries
- Semiconductor: Etching, ion implantation, CVD, PECVD, MOCVD, and SIC-CVD clean/medium/harsh process applications.
- Photovoltaic: Crystal growth furnaces, cell manufacturing processes.
- Lithium Battery: Cell vacuum drying, electrolyte filling, and degassing processes.
- Flat Panel Display & LED: Manufacturing processes requiring high-cleanliness vacuum environments.
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Get in Touch
Have questions about our products or want to discuss a custom order? Our team is ready to help you.
Company
SUZHOU KACO VACUUM EQUIPMENT CO.,LTD.
Location
#3,No.152 Kangzhuang Rd,Zhoushi Town,Kunshan city,Suzhou,PRC.
Contact Person
Joyce