Table Rapid Annealing Furnace 6-inch Wafer Rapid Annealing Furnace High Precision Wafer Rapid Annealing Oven Lab Test Ma

LRP-Table-6 is a desktop 6-inch wafer rapid annealing furnace, which uses two layers of infrared halogen lamps as the heat source to heat the internal quartz cavity for thermal insulation, and the cavity shell is water-cooled aluminum alloy, so that the product is heated evenly and the surface temperature is low.

LRP-Table-6 is controlled by PID algorithm, and the system can quickly adjust the output power of the infrared halogen lamp, making the temperature control more accurate.

Product features

1. Double-layer infrared halogen lamp heating, nitrogen quickly cooling;

2. Self-developed lamps are arranged in groups to make the temperature uniformity better;

3. Controlled by PID algorithm, the power output of the lamp is adjusted in real time;

4. User accounts are divided into three levels of permissions to facilitate information management;

5. The main interface of the software can display gas, temperature, vacuum and other parameters in real time;

6. The system automatically saves the relevant information of each process;

7. Automatically identify error information, and automatically protect the device when there is an abnormality:

8. Overheating detection: The temperature of the water-cooled aluminum alloy in the cavity housing exceeds 70°C

9. Thermocouple detection: During the system process, the thermocouple monitoring value does not match the setting

10. Heating detection: Abnormal output power when heated

11. Furnace door lock detection: whether the door lock is locked before each process

12. Gas detection: gas pressure exceeds the set range, gas pressure is too large or too small

13. Water flow detection: The water inlet flow rate is lower than the default value

14. Water leak detection: Water leakage is detected

15. Emergency stop switch: Immediately stop the process and cut off the heat source

LRP-Table-6 Industry Applications

1. IMP annealing

2. Rapid annealing after ITO coating

3. oxides

4. Nitride growth

5. Silicide alloy annealing

6. Gallium arsenide process

7. Ohmic contact fast alloy

8. Oxidation reflux

9. Other Semiconductor Rapid Heat Treatment Processes