Optical Thin Film Deposition System Advanced electron beam beam vacuum coating machine designed for laboratory scientific research applications in optical thin film deposition. Technical Specifications Component Specification Vacuum Chamber φ800×H900mm Heating Method Top, Side, Bottom (optional) High Vacuum System Molecular Pump, Diffusion Pump, Cryogenic Pump (Optional) Low Vacuum System Dry Pump, Direct Pump, Roots Pump, Rotary Vane Pump (optional) Control System Industrial Computer Touch Screen Fully Automatic Control Crystal Film Thickness Monitor Inficon XTC-3, SQC310, Shanghai MXC-3B Ion Source RF Ion Source, Hall Ion Source, Kaufman Ion Source, Hollow Cathode Ion Source (optional) Rotation of Workpiece Umbrella Workpiece Holder, Roller Workpiece Holder (optional) Electron Beam Single, Double, Multi-position (optional) Cryogenic Unit Multiple Suppliers (optional) Probe System Single, 6-point and 12-point Rotary Sensor (optional) Ultimate Pressure ≤8.0×10⁻⁵Pa (clean vacuum chamber at normal temperature, free of sample and coating material) Vapor Barrier System Unit Block, Two-position Block and Multi-position Rotary Block (optional) Vacuum Pressure Maintaining Close high valve, vacuum degree ≤9×10⁻²Pa after 1 hour Required Power Supply Three-phase Electricity, 380V, 50HZ Water Pressure Required 0.3-0.4Mpa Equipment Weight 3T-4T Air Pressure Required 0.6-0.8Mpa Key Features Reactive Magnetron Sputtering with RF I-beam Assistant for AR, Evaporation for AF One-stop Mode for Multi-coating: AR with AF Top Coating and Hardness of 9H+ Layers Process Wide Selection of Materials and Complete Film Types Excellent Film Accuracy, Hardness, Abrasion-resistance and Adhesion Natural Non-Residual Stress Characteristics Superior Processing Stability, Uniformity and Repeatability User-Friendly Interface with Intuitive Operation High Yield and Low Energy Consumption Applications Optical coaters control light characteristics by coating optical component surfaces, enabling precise optical performance across multiple industries. Primary Application Areas Optical Equipment: Camera/Microscope Lens Anti-Reflection Coating, Mirror High Reflection Coating, Spectrometer Filter Optical Communication & Photovoltaic: Anti-reflective coating for optical fiber devices, anti-reflection coating for solar cells, coating for wavelength division multiplexing components Display & Lighting: Screen anti-glare film, projector beamsplitting film, LED lamp reflective film Laser Technology: Laser resonator high reflection coating, laser processing head high temperature resistant film Functional Glass: Architectural Low-E film, car sunscreen film, optical filter Other Fields: Anti-radiation film for aerospace remote sensing lenses, anti-fog film for medical endoscopes Advanced Capabilities Equipped with quartz crystal or optical film thickness control instrument for automatic and precise film thickness control. Ion bombardment device purifies substrate surfaces for superior adhesion between film layers and substrates. Large crucible electron beam ensures smooth film material surfaces and even distribution throughout evaporation. Programmable controller (PLC) with touch screen (HMI) interface enables easy operation and manual/full automatic control switching.