Sapphire Substrate

Sapphire wafer 2inch C-plane(0001) DSP SSP 99,999% Monocrystalline Al2O3 LEDS Semiconductor Description of Sapphire Wafer: The sapphire wafer is a common substrate for preparing III-V nitrides, superconductors, and magnetic epitaxial films due to its low lattice mismatch and good physical and chemical stability. It is widely used in GaN/ZnO/AIN non-polar and half-order epitaxial growth, various semiconductor thin films epitaxial growth, Silicon On Sapphire, optical windows,

Product Overview Metallized sapphire substrates are functional substrate materials manufactured by depositing metallic thin films onto high-purity single-crystal sapphire (Al₂O₃). By combining the excellent electrical insulation, high hardness, chemical stability, and thermal stability of sapphire with the functional properties of metal films, these substrates provide a versatile solution for advanced electronic devices, RF components, optoelectronic systems, and semiconducto

Sapphire Wafer 12inch AL2O3 Customization DSP SSP C plane A plane M plane LED Sapphire substrate Product Description of 12inch Sapphire wafer: Sapphire is a material of a unique combination of physical, chemical, and optical properties, which make it resistant to high temperature, thermal shock, water and sand erosion, and scratching. It is a superior window material for many IR applications from 3µm to 5µm. C-plane sapphire substrates are widely used to grow III-V and II-VI

Precision Gold Plating Service We provide professional precision gold plating services for semiconductor packaging, optoelectronic components, precision electronics, RF devices, sensors, and customized metal parts. Our service covers surface pretreatment, activation, nickel underplating, gold plating, cleaning, inspection, and quality control. Based on the substrate material, part geometry, plating area, and final application, we can provide customized plating solutions for

Sapphire Crystal Overview Sapphire crystal is a synthetic single-crystal aluminum oxide (Al₂O₃) material renowned for its exceptional hardness, optical transparency, thermal stability, and chemical resistance. With a Mohs hardness of 9—second only to diamond—sapphire crystal is widely used in semiconductor manufacturing, optical systems, aerospace, medical devices, defense, consumer electronics, and luxury watches. As a professional sapphire crystal manufacturer, we provide

Introduce Quartz flanges are precision-engineered components made from high-purity fused quartz. They are widely used for connecting, sealing, supporting, and positioning quartz tubes, chambers, reactors, and vacuum equipment. Thanks to their excellent thermal stability, low coefficient of thermal expansion, high chemical resistance, and electrical insulation properties, quartz flanges are suitable for demanding applications in the semiconductor, photovoltaic, laboratory,

Product Overview TGV Glass, also known as Through Glass Via Glass Substrate, is an advanced glass-based interconnect material used for high-density packaging and vertical electrical connection. By forming precision micro-vias through glass and applying metallization or copper filling processes, TGV glass enables reliable electrical connection between the top and bottom surfaces of the substrate. Compared with traditional silicon or organic substrates, TGV glass offers

WS₂ on Sapphire Wafer | High-Quality 2D Semiconductor TMD Film Supplier Product Overview WS₂ on Sapphire Wafer is a high-quality two-dimensional semiconductor material composed of tungsten disulfide film grown on a sapphire substrate. WS₂, also known as tungsten disulfide, belongs to the family of transition metal dichalcogenides, commonly referred to as TMD materials. Due to its unique layered structure, optical response, and semiconductor properties, WS₂ has become one of

Product Overview The 310 × 310 mm sapphire heat dissipation substrate is a large-size thermal and insulating substrate made from high-purity single crystal sapphire. It offers excellent thermal conductivity, electrical insulation, high-temperature resistance, chemical stability, and mechanical strength. This product is suitable for high-power electronic devices, LED packaging, semiconductor processing carriers, optoelectronic components, laser modules, and precision thermal

Product Overview Sapphire ITO coated substrate is a high-performance material consisting of a single-crystal sapphire (Al₂O₃) wafer coated with a transparent conductive Indium Tin Oxide (ITO) thin film. This combination integrates: The exceptional mechanical strength and thermal stability of sapphire The excellent electrical conductivity and optical transparency of ITO Compared with conventional glass-based ITO substrates, sapphire-based solutions provide superior durability,

Product Overview Flame-fusion sapphire crystal, also known as Verneuil-grown sapphire, is a high-purity synthetic single crystal produced through a continuous melting and crystallization process. The Morgan pink color is achieved by carefully introducing trace elements during growth, resulting in a soft, elegant pink tone with excellent optical clarity. This material combines aesthetic appeal with outstanding physical and chemical properties, making it ideal for both

Synthetic Ruby Laser Rods (Cr:Al₂O₃) for Laser Equipment Length up to 200 mm Product Overview: Our synthetic ruby laser rods are grown using the Verneuil (Flame Fusion) method, a mature and widely adopted crystal growth process for laser-grade ruby. This method enables good crystal homogeneity, controlled chromium (Cr³⁺) dopant distribution, and reliable optical performance suitable for commercial and industrial laser applications. Verneuil-grown ruby crystals exhibit high

Sapphire custom plates with a single-side polished surface are high-precision optical and structural components manufactured from premium single-crystal aluminum oxide (Al₂O₃). Owing to their exceptional hardness, excellent optical transmission, high thermal resistance, and chemical stability, sapphire plates have become indispensable in advanced optical systems, semiconductor processing, high-end industrial equipment, and scientific instrumentation. The single-side polished

Product Overview TGV (Through Glass Via) technology, also known as glass through-hole technology, is a vertical electrical interconnection technique that penetrates glass substrates. It enables vertical electrical connections on glass substrates, achieving high-density interconnections between chips, as well as between chips and substrates. While TSV (Through Silicon Via) technology is used for interposers in silicon-based substrates, TGV serves the same purpose in glass

Sapphire Wafer Monocrystal Al2O3 DSP SSP 2inch 4inch 6inch 8inch 12inch A plane C plane Description: Sapphire substrates are widely used in the production of III-V nitrides, superconductors, and magnetic epitaxial films due to their low lattice mismatch and excellent physical and chemical stability. They are extensively employed in non-polar and semi-polar epitaxial growth of materials such as GaN, ZnO, AlN, various semiconductor thin film epitaxial growth processes, Silicon

Sapphire wafer 2inch C-plane(0001) DSP SSP 99,999% Monocrystalline Al2O3 LEDS Semiconductor Description of Sapphire Wafer: The sapphire wafer is a common substrate for preparing III-V nitrides, superconductors, and magnetic epitaxial films due to its low lattice mismatch and good physical and chemical stability. It is widely used in GaN/ZnO/AIN non-polar and half-order epitaxial growth, various semiconductor thin films epitaxial growth, Silicon On Sapphire, optical windows,

Through glass vias (TGV) for JGS1 JGS2 sapphire corning glass for Sensors Manufacturing and Packaging Product abstract Our Through-Glass Vias (TGV) technology offers an innovative solution for the manufacturing and packaging of sensors, utilizing premium materials such as JGS1, JGS2, sapphire, and Corning glass. This technology is designed to enhance the performance, reliability, and integration capabilities of sensors used across various industries including automotive,

2inch 50.8mm C Miscut A 4 Degree Sapphire Wafers Thickness 0.175mm/0.3mm/0.4mm/0.5mm Dsp 2 Inch C Plane Polished Sapphire Wafers Crystal Substrates The specifications of 2inch sapphire wafer substrate Material: High Purity >99.99%, single crystal Al2O3 Dimension: 50.8 mm +/- 0.1 mm Thickness: 430 um +/- 25 um for SSP and 400 um +/- 25 um for DSP (other thickness available upon request) Lattice Parameter: a=4.785 A, c=12.991 A Density: 3.98 g/cm3 Orientation: C plane (0001) to

8inch Dia200mm C-Plane Al2O3 99.999% Sapphire Single Crystal Wafer Carrier Substrate 1sp 2spProduct Description:Sapphire Substrate is a single crystal material made of Al2O3 99.999% with a surface orientation of ±0.5° and a flatness of λ/10@633nm. It is available in thicknesses of 0.5-2mm. It is widely used for sapphire windows of 2inch, 4inch and 6inch.Sapphire Substrate has excellent thermal, electrical and optical properties, making it ideal for sapphire windows. It is

Product Overview 12 inch sapphire wafers are ultra-large diameter single-crystal sapphire substrates manufactured for advanced semiconductor and optoelectronic applications. Compared with traditional 2–6 inch sapphire wafers, 12 inch sapphire wafers significantly improve production efficiency, material utilization, and device uniformity, making them an ideal choice for next-generation LED, power electronics, and advanced packaging technologies. Our 12 inch sapphire wafers are