Fused Silica Wafer
4'' 6'' Fused Silica Wafer 500μm SiO2 HPFS with Double Side Polishing and 1100°C Heat Resistance
High purity fused silica wafers with 500μm thickness and diameters of 4''/6''. Features double-side polished surfaces (Ra < 1 nm), excellent chemical resistance, and dimensional stability with ultra-low thermal expansion. Ideal for optical applications requiring superior transmission characteristics and thermal performance up to 1100°C.
4 Inch 100mm SiO2 Fused Silica Wafer Corning 7980 - 500μm Thickness DSP Surface
Premium 4-inch fused silica wafers with 100mm diameter and 500μm thickness. Double-side polished with surface roughness Ra < 1 nm. High purity Corning 7980 material with excellent thermal stability (1100°C max temperature) and dielectric properties. Available for immediate shipment with custom fabrication options.
IR Grade Fused Silica Wafer JGS3 C7979 SK1310 200mm Diameter with Less Than 5ppm OH Content
Premium IR grade fused silica wafers with transmission from 185nm to 350nm and very low OH content (
UV Grade Fused Silica Wafer 3'' 4'' 6'' JGS1 JGS2 JGS3 with 76.2-300mm Diameter and <1.0nm Surface Roughness
High-precision UV grade fused silica wafers available in 3", 4", 6" diameters with JGS1, JGS2, JGS3 quartz materials. Features include
6 Inch And 8 Inch Borofloat 33 Wafer For Electronics Optics And Semiconductors
6 Inch And 8 Inch Borofloat 33 Wafer For Electronics Optics And Semiconductors Borofloat 33 Features Schott Borofloat 33 is a flat glass that sets new standards in optical clarity, dimensional stability, and thermal resistance. Borofloat 33 is a unique type of borosilicate glass, renowned for its exceptional flatness and uniformity. Its high thermal expansion coefficient ensures stability even under extreme temperature changes, while its low thermal conductivity makes it an
SSP Surface Fused Silica Wafer for MEMS Manufacturing Process
Product Description: Our Fused Silica Wafer is polished to a surface roughness of less than 1.0nm, or can be specified to meet your exact requirements. This level of precision ensures optimal performance in your semiconductor and MEMS applications. Additionally, our wafer meets the edge rounding requirements of the SEMI M1.2 standard, as well as the IEC62276 specification. We understand that warping can be a concern in many applications, which is why we offer a range of
2" 3" 4" 6" 8" Unbeatable Performance with Our High Purity Fused Silica Wafers for Photonics and Semiconductors
2" 3" 4" 6" 8" Unbeatable Performance with Our High Purity Fused Silica Wafers for Photonics and Semiconductors Elevate Your Tech with Fused Silica Wafers! In the fast-paced world of advanced technology, precision and reliability are non-negotiable. Introducing our premium Fused Silica Wafers – the cornerstone of innovation for high-performance applications. Crafted from ultra-pure fused silica, these wafers offer unmatched optical clarity, thermal stability, and mechani
2" 3" 4" 6" 8" High Performance Fused Silica Wafer for Semiconductor Manufacturing
2" 3" 4" 6" 8"High-Performance Fused Silica Wafer for Semiconductor Manufacturing our Fused Silica Wafers, the epitome of precision and performance for cutting-edge applications in photonics, semiconductors, and beyond. Crafted from high-purity fused silica, these wafers offer unparalleled optical clarity, thermal stability, and mechanical robustness. Our Fused Silica Wafers exhibit excellent transmission across a broad spectral range, making them ideal for high-precisio
High Purity Fused Silica Wafers For Unbeatable Performance 2'' 3'' 4'' 6'' 8'' Wafer-Grade Optical And Microelectronic Designs
High Purity Fused Silica Wafers for Unbeatable Performance 2" 3" 4" 6" 8" Wafer-Grade for Optical and Microelectronic Designs our top-tier Fused Silica Wafers, the premium choice for cutting-edge applications requiring unmatched optical clarity and thermal stability. Crafted from high-purity silica glass through a meticulous fusion process, our wafers exhibit exceptional optical homogeneity and low absorption coefficients, making them ideal for demanding optical systems.
Fused Quartz Wafer for Semiconductor Industry 1000um Thickness and Bow ±40µm
Product Description: This Quartz Wafer is available in various sizes, with Primary Flat dimensions of 22mm, 32.5mm, 42.5mm, 57.5mm/notch, notch, notch. The wafer also has excellent PLTV (
High Precision Fused Silica Wafer 200mm Diameter for LTV 2µm
Product Description:The Fused Silica Wafer has a low total thickness variation (LTV) of less than 2µm, which makes it ideal for applications that require high precision. It also has a low warp of less than 30µm, 40µm, 50µm, 50µm, 60µm, or 60µm, depending on the specific thickness chosen.The Silica Glass Wafer is amorphous and has a high degree of purity, which makes it suitable for use in a variety of applications, including microelectronics, optics, and sensors. The Fused
Customized Polished Side Ra 1.0nm Silica Glass Wafer for MEMS
Product Description: One of the key features of this product is its polished side Ra, which is less than 1.0nm or specific per requested, making it ideal for high-precision applications. The Fused Silica Wafer also has excellent transmission properties, allowing for ultraviolet and visible light to pass through with minimal absorption. This feature makes it an ideal choice for optical applications such as lenses, prisms, and windows. The Fused Silica Wafer is available in
Precision Fused Silica Wafer TTV 20µm PLTV≥95% Diameter 50.8mm for Optimal Performance
Product Description: The Fused Silica Wafer is available in different sizes, thicknesses, and surface finishes. The polished side Ra is less than 1.0nm or can be specified per request. The product is available in JGS1, JGS2, and JGS3 types of glass and quartz wafers for superior optical clarity and chemical stability. The product is also available in different surface finishes, including DSP, SSP, and DSL, depending on the application requirements. The Fused Silica Wafer is
LTV 5mmx5mm 2µm Fused Silica Wafer TTV 20µm for Semiconductor Industry
Product Description: Features: Product Name: JGS1 JGS2 JGS3 Glass and Quartz wafer for Superior Optical Clarity Chemical Stability Material: UV Fused Silica, Fused Quartz (JGS1, JGS2, JGS3) Edge Rounding: Compliant with SEMI M1.2 Standard/refer to IEC62276 Diameter: 50.8mm,76.2mm, 100mm, 150mm, 200mm Warp:
Borofloat 33 Glass Substrate for Semiconductor Industry and MEMS BOROFLOAT33 Glass for Various Application
Borofloat 33 Glass Substrate for Semiconductor Industry and MEMS BOROFLOAT33 Glass for Various Application Unlock the potential of your applications with Borofloat 33 Glass Substrate. This high-performance borosilicate glass is designed to meet the demands of today's advanced technologies. Borofloat 33 offers exceptional optical clarity, ensuring your devices and instruments perform at their peak. Whether you're working in semiconductor manufacturing, flat panel displays, or
2" 3" 4" 6" 8" Synthetic Quartz JGS2 For Optics And Scientific Instruments
2" 3" 4" 6" 8" Synthetic Quartz JGS2 for Optics and Scientific Instruments In the world of precision optics, fused silica and fused quartz stand out as the premier materials for delivering unparalleled clarity, durability, and stability. Our fused silica products exhibit exceptional optical transparency, making them ideal for applications requiring high-resolution imaging and precise measurements. The unique fusion process ensures the elimination of internal defects,
UV Grade Fused Silica Wafer 3'' 4'' 6'' JGS1 JGS2 JGS3 for Glass and Quartz Materials
UV Grade Fused Silica Wafer 3' 4' 6' JGS1 JGS2 JGS3 for Glass and Quartz Materials The Epitome of Optical Clarity and Precision Elevate your optical applications with our cutting-edge fused silica wafers. Crafted from the purest silica glass, these wafers offer unparalleled optical clarity and precision, making them the ideal choice for a wide range of industries. Whether you're developing high-end optical components, precision instrumentation, or any other application that
3.5um Fd Silica Wafer With Corning 7980 FHUV OHARA1300 Schott BF33 Zerodur
Product Description: Fused Silica Wafer is a high-performance, cost-effective IC Silicon Wafer product that is widely used in the semiconductor, MEMS and medical industries. It is made from high-purity fused quartz, and it is a high-end material for the production of electronic products and components. Its unique properties make it ideal for many applications, including optical elements, optical lenses, and other optical components. The surface of the Fused Silica Wafer is
F-HUV Quartz Borosilicate Glass Wafer 10mm For MEMS And Semiconductor
Product Description: Fused Silica Wafer is a type of IC Silicon Wafer, also known as Aluminum Silicate Glass. It is produced by melting pure quartz sand and other minerals at high temperatures. Fused Silica Wafer has very low thermal expansion coefficient, excellent electrical insulation properties, and superior thermal shock resistance. It is widely used in semiconductor and optoelectronic industries. Fused Silica Wafer is available from well-known brands such as Corning,
Primary Flat 16±2mm Fused Silica Glass Substrates Wafer With Inspection Report 5 Arc Sec
Product Description: Fused Silica Wafer is made from alumina silicate glass and borosilicate glass. It is an ideal material for many applications due to its excellent optical properties and low coefficient of thermal expansion. It has a wide range of uses including optical components, semiconductor wafers and microelectronic components. Fused Silica Wafer is available in different sizes, ranging from 2 to 12 inch in diameter. It has a bevel of 0.25mm X 45° and has a warp of