Thin Film Substrate Sapphire Wafer Al2O3 Single Crystal Substrate
Price:
Negotiable
MOQ:
1 Piece
Delivery Time:
3-4 weeks
Brand:
Crystro
Product Description
Thin Film Substrate Aluminum Oxide Al2O3 Single Crystal Substrate Sapphire Wafer
Introduction:
Al2O3(Aluminum Oxide) is an excellent superconducting thin film substrate. This material has many advantages: good thermos-stability,
high thermal conductivity, and high hardness. It also could be used in many other fields like industrial, defense and security and scientific research.
| Crystal Structure | M6 | Melting Point | 2040℃ |
| Density | 3.98 g/cm3 | Polishing | Single side/double side polished |
| Hardness | 9.0 (Mohs) | Redirection the edge | 2°(special in 1°) |
| Lattice Parameters | a = 4.758 Å c =12.99 Å | Ra | ≤5Å(5µm×5µm) |
| Orientation |
A-plane <11-20> M-plane <10-10> R-plane <1-102> C-plane <0001> |
Size |
5*5*0.5mm 10*10*0.5mm |
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Company
ANHUI CRYSTRO CRYSTAL MATERIALS Co., Ltd.
Location
No. 176, Yuner Road Industrial Park, Hefei City, Anhui, China
Contact Person
Zheng