Guotai Customzied Radio Frequency Magnetron Sputtering System

1. Application direction: research and teaching

2. Product advantages: Inclined co-sputtering, single-chip delivery sample room, separate metal coating room and non-metal coating room

3. Product configuration:

★ Sample quantity and size: 1 piece of Ф4 inches or more~Ф10 inches

★ Sputtering material: metal and non-metal.

★ Sputtering chamber: Both coating chambers are high vacuum systems.

★ Sputtering unevenness: ≤±3%-±5%

★ Magnetron target: 2-4 pieces per coating room; adjustable angle; adjustable distance

★ Sputtering direction: sample bottom (sputtering from top to bottom) or sample top (sputtering from bottom to top)

★ Heating: conventional heating, optional high temperature heating

★ Power supply configuration: RF; DC; DC pulse; DC bias

★ Cleaning function: optional Kaufman ion source

★ Fast reaction sputtering function: optional Speedflo

★ Film thickness monitoring function: optional crystal control film thickness online monitoring and end point control

★ Operation mode: automatic + semi-automatic control

Similar products: Single cavity sputtering chamber + single chip sampling chamber (MSP-3200)

For the detailed structure and function of the equipment, please consult the sales engineer.