Magnetron Sputtering Coating Machine

Guotai PVD Magnetron Sputtering Machine Best Price With Customized Features 1. Application direction: small batch production 2. Product advantages: vertical sputtering, multi-chip sampling chamber (Load-Lock) 3. Product configuration: ★ Sample quantity and size: 6-9 pieces; Ф3 inch ~ Ф8 inch ★ Sputtering materials: metal; non-metal; compound and other thin film materials. ★ Sputtering chamber: high vacuum system. ★ Load-Lock: Low vacuum system, high vacuum system. Packed in 6

Customized Magnetron Sputtering Coating Machine With Flexible Configurations Magnetron sputtering is a deposition technology involving a gaseous plasma which is generated and confined to a space containing the material to be deposited – the ‘target’. The surface of the target is eroded by high-energy ions within the plasma, and the liberated atoms travel through the vacuum environment and deposit onto a substrate to form a thin film. In a typical sputtering deposition process

Guotai Customzied Radio Frequency Magnetron Sputtering System 1. Application direction: research and teaching 2. Product advantages: Inclined co-sputtering, single-chip delivery sample room, separate metal coating room and non-metal coating room 3. Product configuration: ★ Sample quantity and size: 1 piece of Ф4 inches or more~Ф10 inches ★ Sputtering material: metal and non-metal. ★ Sputtering chamber: Both coating chambers are high vacuum systems. ★ Sputtering unevenness: ≤

Guotai Customzied Magnetron Sputtering System For Optical Films And Films 1. Application direction: mass production of flake samples 2. Product advantages: rectangular magnetron target side coating, vertical equipment 3. Product configuration: ★ Sample quantity and size: 14000 pieces/furnace, L10mm*W5mm*D5mm (customized according to target size and sample size) ★ Sputtering materials: metal; non-metal; compound and other thin film materials. ★ Sputtering chamber: high vacuum

Magnetron Sputtering Coating Machine With Customized Features For Optics Thin Film Production Magnetron sputtering is a highly versatile thin film deposition technique for coating films with excellent adhesion and high density. A type of physical vapor deposition (PVD) coating technology, magnetron sputtering is a plasma-based coating process where a magnetically confined plasma is created near the surface of a target material. Positively charged energetic ions from the

RF Magnetron Sputtering System Quarts Crystal Optic Coating Machine Magnetron sputter deposition does not require melting and evaporation of the source material, leading to many advantages over other PVD technologies: first, nearly all materials can be deposited by magnetron sputtering regardless of their melting temperature; second, sources can be scaled and positioned anywhere in the chamber based on the requirements of the substrate and the coating; finally, films of

Magnetron Sputtering Coating Machine For Optical Coatings Production Support Customized Features Magnetron sputtering uses a closed magnetic field to trap electrons, increasing the efficiency of the initial ionization process and creating the plasma at lower pressures, reducing both background gas incorporation in the growing film and energy losses in the sputtered atom through gas collisions. Magnetron sputtering is often chosen for the deposition of metallic and insulating

Magnetron Sputtering Coating Machine Support Customized Features with Excellent Performance Sputtering is the thin film deposition manufacturing process at the core of today’s semiconductors, disk drives, CDs, and optical devices industries. On an atomic level, sputtering is the process whereby atoms are ejected from a target or source material that is to be deposited on a substrate - such as a silicon wafer, solar panel or optical device - as a result of the bombardment of

Guotai Customized PVD Magnetron Sputtering Coating Machine MSP-300B 1. Application: research and teaching 2. Product advantages: high efficiency + multi-function; vertical sputtering + inclined co-sputtering 3. Product configuration: ★ Sample quantity and size: 6 pieces of Ф2 inches (vertical sputtering) + 1 piece of Ф4 inches (total sputtering) ★ Sputtering materials: metal; non-metal; compound and other thin film materials. ★ Sputtering chamber: high vacuum system. ★

Guotai DC Magnetron Sputtering Machine With Customized Features DISC-SP-3200 1. Application direction: research and teaching 2. Product advantages: Inclined co-sputtering, single chip sending to the sampling chamber (Load-Lock) 3. Product configuration: ★ Sample quantity and size: 1 piece Ф2 inch ~ Ф6 inch ★ Sputtering materials: metal; non-metal; compound and other thin film materials. ★ Sputtering chamber: high vacuum system. ★ Load-Lock: Low vacuum system or high vacuum