Guotai PVD Magnetron Sputtering Machine Best Price With Customized Features

1. Application direction: small batch production

2. Product advantages: vertical sputtering, multi-chip sampling chamber (Load-Lock)

3. Product configuration:

★ Sample quantity and size: 6-9 pieces; Ф3 inch ~ Ф8 inch

★ Sputtering materials: metal; non-metal; compound and other thin film materials.

★ Sputtering chamber: high vacuum system.

★ Load-Lock: Low vacuum system, high vacuum system. Packed in 6-9 pieces, samples are delivered automatically.

★ Sputtering unevenness: ≤±3%-±5%

★ Magnetron target: 2-4 pcs

★ Sputtering direction: sample bottom (sputtering from top to bottom), sample top (sputtering from bottom to top)

★ Sample table rotation: revolution and rotation at the same time; revolution only

★ Heating: conventional heating, optional high temperature heating

★ Power supply configuration: radio frequency; DC; DC pulse; intermediate frequency; DC bias

★ Cleaning function: optional Kaufman ion source, radio frequency ion source

★ Fast reaction sputtering function: optional Speedflo

★ Film thickness monitoring function: optional crystal control film thickness online monitoring and end point control

★ Precision optical film system: optional

★ Operation mode: automatic + semi-automatic control

Similar products: MSP-400C

For the detailed structure and function of the equipment, please consult the sales engineer.