Customized Magnetron Sputtering Coating Machine With Flexible Configurations

Magnetron sputtering is a deposition technology involving a gaseous plasma which is generated and confined to a space containing the material to be deposited – the ‘target’. The surface of the target is eroded by high-energy ions within the plasma, and the liberated atoms travel through the vacuum environment and deposit onto a substrate to form a thin film.

In a typical sputtering deposition process, a chamber is first evacuated to high vacuum to minimize the partial pressures of all background gases and potential contaminants. After base pressure has been reached, sputtering gas which comprises the plasma is flowed into the chamber and the total pressure is regulated – typically in the milliTorr range – using a pressure control system.

1. Application direction: research and teaching

2. Product advantages: Inclined co-sputtering, single-chip delivery sample room, separate metal coating room and non-metal coating room

3. Product configuration:

★ Sample quantity and size: 1 piece of Ф4 inches or more~Ф10 inches

★ Sputtering material: metal and non-metal.

★ Sputtering chamber: Both coating chambers are high vacuum systems.

★ Sputtering unevenness: ≤±3%-±5%

★ Magnetron target: 2-4 pieces per coating room; adjustable angle; adjustable distance

★ Sputtering direction: sample bottom (sputtering from top to bottom) or sample top (sputtering from bottom to top)

★ Heating: conventional heating, optional high temperature heating

★ Power supply configuration: RF; DC; DC pulse; DC bias

★ Cleaning function: optional Kaufman ion source

★ Fast reaction sputtering function: optional Speedflo

★ Film thickness monitoring function: optional crystal control film thickness online monitoring and end point control

★ Operation mode: automatic + semi-automatic control

Similar products: Single cavity sputtering chamber + single chip sampling chamber (MSP-3200)

For the detailed structure and function of the equipment, please consult the sales engineer.