0-2um Polycrystalline Diamond Micron Powder For Polishing Watch Glass
OEM 0-2 micron Polycrystalline Diamond Powder For Polishing Watch Glass
Description:
Our polycrystalline diamond is produced by detonation with high energy explosive, the high explosive heat and high detonating pressure change the graphite into poly diamond, and its structure is similar to natural carbonado diamond. Because synthesis time is very short, there are some lattice defects inside the crystal, almost all the diamond particle is composed by integrating the micro crystallites size of less than 20nm together through sharing the crystal face. In processing special material, poly diamond will not scratch the workpiece’s surface, because its compressive strength and impact strength are far below common diamond products. Under certain pressure, microcrystal grain of poly diamond particle surface will continuously peel off and form new cutting edge. These characteristics provide solutions for grinding and polishing some high hardness special materials rapidly. Experiments show that the removal rate of poly diamond is 2-4 times higher than common diamond and without scratches. Based on years of mature experience of monocrystalline diamond powder, we have successfully resolved the technical processing issues of polycrystalline diamond, such as crushing, reshaping, purifying, grading etc. We supply bulk polycrystalline diamond powder consistent with the standard requirements of monocrystalline diamond powder.
Available Sizes of Polycrystalline Diamond Powder:
| Range | 0-1 | 1-2 | 1-3 | 2-4 | 2-5 | 3-6 | 3-7 | 4-8 | 5-10 | 6-12 | 8-12 |
| HID PD | √ | √ | √ | √ | √ | √ | √ | √ | √ | √ | √ |
Particle Size Distribution Specification for Superabrasive Grains
| Size | D10≥(µm) | D50(µm) | D95≤(µm) | Max(µm) | Min(µm) |
| 0-0.25 | 0.1 | 0.170~0.210 | 0.38 | -- | -- |
| 0-0.5 | 0.12 | 0.220~0.280 | 0.51 | --- | -- |
| 0-1 | 0.42 | 0.501~0.580 | 0.795 | 1.156 | 0.375 |
| 0.5-1 | 0.472 | 0.581~0.690 | 1.053 | 1.375 | 0.375 |
| 0.5-1.5 | 0.504 | 0.691~0.871 | 1.298 | 1.945 | 0.375 |
| 0-2 | 0.62 | 0.872~0.985 | 1.542 | 2.312 | 0.446 |
| 1/2 | 0.761 | 0.986~1.224 | 1.894 | 3.27 | 0.63 |
| 0.5-3 | 0.94 | 1.225~1.487 | 2.401 | 3.889 | 0.63 |
| 1/3 | 1.048 | 1.488~1.712 | 2.882 | 4.625 | 0.75 |
| 1.5-3 | 1.169 | 1.713~2.014 | 3.321 | 5.5 | 0.75 |
| 2/3 | 1.392 | 2.015~2.302 | 3.663 | 6.541 | 0.892 |
| 2/4 | 1.644 | 2.303~2.754 | 4.496 | 7.778 | 0.892 |
| 2/5 | 1.803 | 2.755~3.312 | 5.5 | 9.25 | 1.06 |
| 3/6 | 2.448 | 3.313~3.898 | 6.386 | 11 | 1.499 |
| 3/7 | 2.913 | 3.899~4.676 | 7.566 | 13.08 | 1.783 |
| 4/8 | 3.605 | 4.677~5.400 | 8.455 | 15.56 | 2.121 |
| 4/9 | 3.952 | 5.401~6.062 | 9.762 | 18.5 | 2.522 |
| 5/10 | 4.401 | 6.063~6.700 | 10.98 | 18.5 | 2.999 |
| 5/12 | 5.022 | 6.701~7.673 | 12.95 | 22 | 3.566 |
| 6/12 | 5.807 | 7.674~8.549 | 13.97 | 26.16 | 4.241 |
| 7/14 | 6.411 | 8.550~9.483 | 15.13 | 26.16 | 4.241 |
| 8/16 | 7.113 | 9.484~10.78 | 17.82 | 31.11 | 5.044 |
| 8/20 | 8.102 | 10.79~12.56 | 20.6 | 37 | 5.998 |
| 10/20 | 9.186 | 12.57~14.18 | 22.54 | 37 | 7.133 |
| 12/22 | 10.53 | 14.19~16.05 | 24.41 | 44 | 7.133 |
| 12/25 | 12.01 | 16.06~17.65 | 26.61 | 44 | 8.482 |
| 15-25 | 13.32 | 17.66~19.55 | 29.75 | 52.33 | 10.09 |
| 20-30 | 15.04 | 19.56~22.50 | 34.64 | 62.23 | 12 |
| 22-36 | 17.28 | 22.51~26.12 | 39.98 | 74 | 12 |
| 30-40 | 20.11 | 26.13~30.10 | 46.56 | 88 | 14.27 |
| 30-50 | 22.36 | 30.11~34.58 | 52.87 | 88 | 16.96 |
| 36-54 | 25.68 | 34.59~39.00 | 60.94 | 104.7 | 20.17 |
| 40-60 | 29.45 | 39.01~43.20 | 69.86 | 124.5 | 20.17 |
| 50-70 | 32.42 | 43.21~47.50 | 72.65 | 124.5 | 23.99 |
| 54-80 | 36.56 | 47.51~52.50 | 80.74 | 124.5 | 23.99 |
Feature:
Round particle shape, no irregular shapes like pencils or flakes
Oversizes completely removed
Narrow PSD
Surface purity can reach ppm level
Outstanding dispersibility.
Tight, customized particle size distribution
Blocky and rough particle surface
Stringent oversize control
Low scratch count
Self-sharpening with high material removal rate
Characteristics:
Round particle shape, no irregular shapes like pencils or flakes.
Oversizes completely removed.
Narrow PSD.
Surface purity can reach ppm level.
Outstanding dispersibility.
Application for Polycrystalline Diamond Powder HID PD:
Polycrystalline diamond is primarily for high-performance grinding and polishing process. It can be widely used for grinding and polishing of silicon wafer, ruby, sapphire, optical lens, metallographic sample, optical fiber communication and ceramics in IT industry, as well as disc modification, magnetic head polishing and substrate grinding.
Lapping and polishing of semiconductor wafers such as SiC and sapphire wafers
Surface polishing of various ceramics
Surface treatment of metals, such as stainless steel and aluminium alloy.
Workpieces Processing
- Silicon wafers, monocrystalline and polycrystalline silicon, semiconductor wafers, photovoltaic wafers
- Sapphire phone screen, sapphire mobile phone screen saver, camera sapphire screen protective film
- Sapphire mobile phone camera protective film, mobile phone cover glass, sapphire watch mirror
- Precision cemented carbide, precision ceramics, optical glass and lens, etc.
Get in Touch
Have questions about our products or want to discuss a custom order? Our team is ready to help you.