Spectroscopic Ellipsometer for Micro-area Pattern Structure Measurement Spectroscopic Ellipsometer Instrument
Spectroscopic Ellipsometer for Micro-area Pattern Structure Measurement Spectroscopic Ellipsometer Instrument
I. Overview
LR-SE-M is a dedicated spectroscopic ellipsometer customized for the semiconductor industry for micro-area pattern structure measurement. It adopts 1. ultra-miniature light spot detection measurement technology and 2. customized ultra-fast measurement speed technology. It can be applied to the measurement of n/k/d of anti-reflection films, conductive films and other thin films on various transparent substrates, and is perfectly suitable for the optical parameter analysis of various micro-area patterns.
II. Special Features
1. The spot size can be customized, with the minimum reaching 30um.
2. Ultra-fast measurement, with a single measurement time of less than 0.5 seconds;
3. The series configuration is flexible and supports customized functional design.
4. Compact structure, more suitable for online integrated measurement.
III. Measurement Examples
Microstructure measurement of captured area in the image
Spectroscopic Ellipsometer for Micro-area Pattern Structure Measurement Spectroscopic Ellipsometer Instrument
Technical Specification
|
Wavelength Range |
250 nm to 1700 nm |
|
Spot Size |
1 mm to 5 mm (variable) |
|
Sample Size |
Up to 200 mm in diameter |
|
Measurement Thickness Range* |
~30 μM |
|
Measurement Time |
Approximately 1 second per position point |
|
Incident Angle Range |
20° to 90° (5-degree intervals) |
|
Repeatability Error* |
Less than 1 Å (angstrom) |
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