Dongguan Dafan Optical Technology Co., Ltd.
                                                                                                           
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8 Years
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Halcon Calibration Plate Honeycomb Calibration Board with Minimum Line Width 1µm / 0.55µm, Customizable Size and Glass Ceramic Film Aluminum Material

Price Negotiable
Price: Negotiable
MOQ: 1
Delivery Time: 5 Work Days
Brand: DFOPTIX
Product Description
Halcon Honeycomb Calibration Board

The circular dot calibration board is a high-precision calibration tool engineered for optical systems. It ensures optimal camera calibration, lens distortion correction, and reliable system performance evaluation. Manufactured using advanced photolithography technology, it delivers exceptional accuracy with micron-level precision, making it ideal for high-resolution imaging systems and microscopic applications. Its durable, heat-resistant material guarantees long-term stability, while the precise dot pattern ensures uniformity across the entire board for consistent, reliable calibration results. The board is fully customizable to meet diverse calibration needs, making it well suited for industrial cameras, robotics, and automated vision systems.

Product Features
  • Sharp edges and high positional accuracy
  • Low coefficient of expansion for dimensional stability
  • High precision, with a maximum accuracy of 1µm
  • Full customization support to match specific requirements
Applicable Scenarios

Machine vision calibration across a wide range of equipment, including security systems, film and television production, medical imaging, cameras, drone cameras, photography studios, scientific research instruments, and other precision optical devices.

Base Material Options

The base material of the dot calibration plate is selectable. Different substrates—such as glass, ceramic, film, and aluminum plate—can be customized according to usage scenarios, operating environments, and accuracy requirements.

1. Glass Substrate Parameters
Manufacturing ProcessPhotolithographyGlass SubstrateQuartz glass (fused silica) / soda glass
Minimum Line Width1µm / 0.55µmTransmittance Rate (@550nm)>95%
Feature Accuracy±1µmCoefficient of Thermal Expansion (20–200°C)<5.0×10⁻⁷/K
CoatingYellow chromium, bright chromium, blue chromium (low reflectivity)Expansion Ratio (20–200°C)0.00006% (0.6µm/°C of 1m)
Reflectance<13.4% @550nm
<1.8% @650nm
<2.67% @750nm
Surface Flatness<0.55µm (length <50mm)
<2µm (length <100mm)
<5µm (length >100mm)
Coating Accuracy120nm (±0.20nm)Surface Roughness<0.025µm
Optical Density (OD)Yellow Chromium 3 (Blue 5)Thickness1mm, 1.6mm, 2.3mm, 3mm (±0.2mm); 500×500×4.8mm
White BackgroundMinimum line width: 10µm
White background thickness: 40µm (smooth white coating on the back)
Minimum / Maximum SizeMin: 2×2mm
Max: 800×960mm (±0.1mm)
Positive & Negative ShapesPositive: pattern opaque
Negative: pattern translucent
Appearance and ShapeSquare
2. Ceramic Substrate Parameters
Manufacturing ProcessPhotolithographyTypeMatte chromium on matte ceramics | Bright chrome on glossy ceramics
TypeMatte ceramic | Glossy ceramicCeramic SubstrateZirconia / Alumina
Minimum Line Width4µm | 2µmThickness1mm (±0.1mm, common) | 2mm (common) | 3mm (±0.1mm)
Feature Accuracy±2µm | ±2µmSurface Flatness<30µm (length <100mm) | <60µm (length <200mm)
Appearance Accuracy±0.05mm | ±0.05mmSize RangeMin: 2×2mm (±0.1mm); Max: 228×228mm (±0.1mm)
CoatingChromium | ChromiumSurface Roughness<0.2–0.7µm
Light / Matte CoatingMatte chromium coating | Bright chrome coatingCoefficient of Thermal Expansion (40–400°C)<6.7×10⁻⁶/K
Reflectance<12.88% @550nm
<10.62% @650nm
<12.23% @750nm
—
<9.56% @550nm
<1.89% @650nm
<11.168% @750nm
Unit Weight≥3.66 g/cm³
Coating Thickness100–120nm | 100–120nmRockwell Hardness≥80 HRA
Positive and Negative ShapesPositive film: opaque pattern
Negative film: transparent pattern
Appearance and ShapeLaser cutting of any shape | Square | Ellipse
Protective LayerThe thin film above the chromium layer makes the chromium pattern more durableSpecial ShapePunch | Chamfer | Oblique angle
3. Film Substrate Parameters
Manufacturing ProcessLithography (Film Lithography Machine)ApplicationUsed for transmission / backlight / functional testing
Minimum Line Width10µm / 30µm optionalCoefficient of ExpansionFilm shrinks when heated and expands when cooled; 10µm/°C of 1m. When relative temperature is constant and humidity changes by 1°C, a film of 1m length changes by 10µm (one ten-thousandth)
Feature Accuracy±10µmTransmittance Rate (400–700nm)>90%; ultraviolet <(400–700nm)> infrared
CoatingSilver bromideFilm Substrate Thickness0.18mm (±0.01mm)
Coating Thickness2µmMaximum Size0.71×0.81m (±0.1mm) (minimum line width 10µm)
1.68×3.5m (±0.1mm) (minimum line width 30µm)
Optical Density (OD)OD>4 when 100% black (OD value controllable in grayscale)ColorBlack grayscale, sine grayscale
AppearanceLaser cutting, straight edge cutting, and circular hole hollowing are available
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Company Dongguan Dafan Optical Technology Co., Ltd.
Location Building 2,No. 22, Weijian Road, Chashan Town, Dongguan City, Guangdong Province, China
Contact Person July Qin

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