Rapid Thermal Annealing System
Boost Production Rapid Thermal Processing RTP-SA-8 Annealing System
1.Basic configuration of equipment system 1.1outline The Rapid Thermal Processing is a vertical semi-automatic 8-inch wafer rapid annealing furnace, which uses two layers of infrared halogen lamps as heat sources for heating. The internal quartz cavity is insulated and insulated, and the outer shell of the cavity is made of water-cooled aluminum alloy, ensuring uniform heating of the product and low surface temperature. Rapid Thermal Processing adopts PID control, and the
150mm Rapid Thermal Annealing System With Three Sets Process Gases
RTP-150RL Rapid Thermal Annealing System with Three Sets Process Gases RTP-150RL: Is in the protection atmosphere of the desktop manual rapid annealing system, with infrared visible light heating single piece Wafer or sample, short process time, high temperature control precision, suitable for 2-6 inch wafer.Its unique cavity design, advanced temperature control technology and a unique RL900 software control system over conventional diffusion furnace annealing systems ensures