PVD Magnetron Sputtering Coating Machine Quarts Crystal 9x10-5Pa
Guotai Customized PVD Magnetron Sputtering Coating Machine MSP-300B
1. Application: research and teaching
2. Product advantages: high efficiency + multi-function; vertical sputtering + inclined co-sputtering
3. Product configuration:
★ Sample quantity and size: 6 pieces of Ф2 inches (vertical sputtering) + 1 piece of Ф4 inches (total sputtering)
★ Sputtering materials: metal; non-metal; compound and other thin film materials.
★ Sputtering chamber: high vacuum system.
★ Sputtering unevenness: ≤±3%-±5%
★ Magnetic target: 2-4 pieces; adjustable angle; adjustable distance
★ Sputtering direction: sample bottom (sputtering from top to bottom) or sample top (sputtering from bottom to top)
★ Heating: conventional heating, optional high temperature heating
★ Power supply configuration: RF; DC; DC pulse; DC bias
★ Cleaning function: optional Kaufman ion source
★ Fast reaction sputtering function: optional Speedflo
★ Film thickness monitoring function: optional crystal control film thickness online monitoring and end point control
★ Operation mode: automatic + semi-automatic control
Similar products: MSP-300C; MSP-400B
Selection reference: sample is on the bottom (MSP-300B); sample is on the top (MSP-300BT); equipped with Kaufman ion source (MSP-300BI/MSP-300BTI)
For the detailed structure and function of the equipment, please consult the sales engineer.
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