Guotai Customzied Magnetron Sputtering System For Optical Films And  Films

1. Application direction: mass production of flake samples

2. Product advantages: rectangular magnetron target side coating, vertical equipment

3. Product configuration:

★ Sample quantity and size: 14000 pieces/furnace, L10mm*W5mm*D5mm (customized according to target size and sample size)

★ Sputtering materials: metal; non-metal; compound and other thin film materials.

★ Sputtering chamber: high vacuum system.

★ Sputtering unevenness: ≤±5%-±8%

★ Number of magnetron targets: 2-4 rectangular magnetron targets

★ Magnetic control target installation form: vertical installation

★ Heating: conventional heating

★ Power configuration: RF; DC

★ Cleaning function: ion source cleaning, radio frequency cleaning, and backsplash cleaning modes are optional

★ Fast reaction sputtering function: optional Speedflo

★ Film thickness monitoring function: optional crystal control film thickness online monitoring and end point control

★ Operation mode: automatic + semi-automatic control

Similar products: Batch coating of rod-shaped samples (MSP-5100B)

For the detailed structure and function of the equipment, please consult the sales engineer.