Magnetron Sputtering Coating Machine For Optical Coatings Production Support Customized Features

Magnetron sputtering uses a closed magnetic field to trap electrons, increasing the efficiency of the initial ionization process and creating the plasma at lower pressures, reducing both background gas incorporation in the growing film and energy losses in the sputtered atom through gas collisions. Magnetron sputtering is often chosen for the deposition of metallic and insulating coatings that have specific optical or electrical properties.

1. Application direction: research and teaching

2. Product advantages: Inclined co-sputtering, single-chip delivery sample room, separate metal coating room and non-metal coating room

3. Product configuration:

★ Sample quantity and size: 1 piece of Ф4 inches or more~Ф10 inches

★ Sputtering material: metal and non-metal.

★ Sputtering chamber: Both coating chambers are high vacuum systems.

★ Sputtering unevenness: ≤±3%-±5%

★ Magnetron target: 2-4 pieces per coating room; adjustable angle; adjustable distance

★ Sputtering direction: sample bottom (sputtering from top to bottom) or sample top (sputtering from bottom to top)

★ Heating: conventional heating, optional high temperature heating

★ Power supply configuration: RF; DC; DC pulse; DC bias

★ Cleaning function: optional Kaufman ion source

★ Fast reaction sputtering function: optional Speedflo

★ Film thickness monitoring function: optional crystal control film thickness online monitoring and end point control

★ Operation mode: automatic + semi-automatic control

Similar products: Single cavity sputtering chamber + single chip sampling chamber (MSP-3200)

For the detailed structure and function of the equipment, please consult the sales engineer.