Guotai RF Ion Source Size17cm And 22cm For PVD Coatings

1. Description

The RF ion source designed and manufactured by Guotaivac has a long working time, high energy, and large uniformity area. The ion energy and beam density can be accurately controlled, and the pollution is small. It is suitable for high-end coating applications such as IR-Cut and optical filters.

RF ion source-a high-energy ion source that first uses a 13.56MHz high-frequency signal to excite the electro-ion body to generate plasma, and then separately extract ions and electrons to neutralize the plasma in the space. Mainly used in ion beam assisted deposition or ion beam deposition for highly controlled optical coatings.

2. Main Specification

Model: GTRF-17

Main specifications:

BEAM voltage: 500V-1500V

BEAM current: 300mA-1500mA

ACC voltage: 300V-1300V

E/B: 100%-200%

Energy range: 100eV-1200eV

3. Test result

• Boil in water for 15 minutes, the curve is basically unchanged.
• No film drop is found after the lens is sticking and pulling.