Molybdenum Components For Ion Implanters For Custom Machined Parts

Product description

  Ion implantation is a very important technology in modern integrated circuit manufacturing, which uses ion implantation machines to achieve doping of semiconductors, using tungsten wires as cathodes to emit electrons to bombard gas molecules containing specific impurity elements, resulting in ionized specific impurity atoms accelerated by electrostatic fields to hit the surface of silicon single crystal wafers and into the semiconductor interior, changing the conductive properties and * eventually forming transistor structures.

  On account of the conversion of the ion source into plasma ions will produce an operating temperature of more than 2000°C, the ion beam eruption

will also generate a larger amount of ion kinetic energy, the general metal will quickly burn melt, so the need for inert metal with high mass density to maintain the direction of the ion beam eruption and increase the durability of the components, tungsten molybdenum is of importance.

The materials used in ion implantation molybdenum parts are optimized for traditional tungsten and molybdenum material processes, including fine crystallization, alloying treatment, vacuum sintering and hot isostatic sintering densification, secondary grain refinement and controlled rolling

technology, generally improving the life, high temperature resistance and creep resistance of traditional tungsten and molybdenum materials.

Molybdenum ASTM B387

^A Pending approved methods of analysis,deviations these limits alone sahll not be cause for rejection.