Sputtering Targets

High temperature Sputtering Targets high-density tungsten tube target customized Products Description 1.high purity, after sintering and forging the target purity can usually be higher than 99.95%. In general, under other conditions, the higher the purity of the target, the better the electrical properties of the coating made, the less likely the corresponding circuit to be short-circuited or damaged. 2.Relatively reasonable cost, the use of powder metallurgy direct press

Customized Molybdenum-Niobium Alloy Sputtering Target For Vacuum Coating Deposition Description Molybdenum-niobium targets produced by Achemetal Tungsten & Molybdenum Co., Ltd. include molybdenum-niobium plane targets and molybdenum-niobium rotating targets. Features of targets manufactured by Achemetal 1. High product density, good product compactness and uniform crystal grains; 2. Higher machining property; 3. Relative density of targets: over 99%, relative density of alloy

CuMoCu Materials For Electronics Packaging CuMoCu heat sink from Luoyang factory It is a composite made from Mo and Cu. Similar to W-Cu, CTE of Mo-Cu can also be tailored by adjusting the composition. But Mo-Cu is much lighter than W-Cu, so that it is more suitable for aeronautic and astronautic applications. Specification Type Composition Properties element Content wt% Density CTE ppm/K TC, W/m•K Mass density, g/cm3 Relative density, %T.D Mo70Cu30 Mo Cu 70±1 balance 9.7 ≥99

Customized By Drawing Chromium Plane Sputtering Target For Vacuum Coating Industry Description Sputtering is one of the main techniques for preparing thin film materials. It uses the ions generated by an ion source to accelerate and accumulate in a vacuum to form a high-speed energy ion beam, bombard the solid surface, and exchange kinetic energy between the ions and the atoms on the solid surface. The atoms on the solid surface leave the solid and are deposited on the

China wholesale high quality Sputtering Targets molybdenum sputtering target tube pric Product description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays, electrodes and wiring materials for thin film solar cells and barrier layer materials for semiconductors. These are based on molybdenum's high melting point, high electrical conductivity, low specific impedance, good corrosion resistance and good environmental properties.

Customized Molybdenum-Niobium Alloy Sputtering Target For Vacuum Coating Deposition Description Molybdenum-niobium targets produced by Achemetal Tungsten & Molybdenum Co., Ltd. include molybdenum-niobium plane targets and molybdenum-niobium rotating targets. Features of targets manufactured by Achemetal 1. High product density, good product compactness and uniform crystal grains; 2. Higher machining property; 3. Relative density of targets: over 99%, relative density of alloy

Product description Tantalum products have good high-temperature resistance, good strength, as well as excellent acid-alkali resistance and liquid metal corrosion resistance. The bio-compatibility of tantalum products is increasingly attracting the attention of the medical field. Achemetal can produce tantalum plates with the purity of 99.95% and 99.99% as well as tantalum-tungsten alloy plates and tantalum-niobium alloy plates. We also have the machining capacity of

Product description Chromium targets produced by Achemetal Tungsten & Molybdenum Co., Ltd. include chromium plane targets and chromium-niobium rotating targets. The purity respectively includes: Cr99.5%,Cr99.7%,Cr99.8%,Cr99.9%,Cr99.95%. Features of targets manufactured by Achemetal: Due to the adoption of a hot isostatic pressing process, the product features high density, good compactness and uniform crystal grains. Higher machining property Relative density of targets: over

Product description Molybdenum targets produced by Achemetal Tungsten & Molybdenum Co., Ltd. include molybdenum plane targets (molybdenum round targets and molybdenum strip-type targets) and molybdenum rotating targets. Molybdenum plane targets are formed by processing high-quality plates of our company, and feature high density, no crack and sand hole inside, bright surfaces, uniform color and luster as well as accurate dimensions. Conventional density: 10g/cm³~10.15g/cm³;

Product Detail Product Description Features of targets manufactured by Achemetal 1. Due to the adoption of a hot isostatic pressing process, the product features high density, good compactness and uniform crystal grains; 2. Higher machining property; 3. Relative density of targets: over 99%, relative density of alloy: over 97%; grain size: less than 50um; thermal resistance of films: below 5%; welded rate with back plates: over 98%, film uniformity after target film formation

Product Detail Sputtering Targets Specification Tantalum has an extremely hard texture and the hardness of 6-6.5. Tantalum is a kind of rare metal with steel grey luster, and has the melting point of 2,980℃ and the density of 16.6g/cm3. With similar performance of niobium, tantalum is an extremely stable chemical element. With high ductility, tantalum can be stretched into thin filaments or prepared into thin foils. It has extremely small expansion coefficient, only 6.6 PPM

Product description Tungsten targets produced by Achemetal Tungsten & Molybdenum Co., Ltd. include tungsten plane targets (tungsten round targets and tungsten strip-type targets) and tungsten rotating targets. Tungsten plane targets are formed by processing high-quality plates of our company, and feature high density, no crack and sand hole inside, bright surfaces, uniform color and luster as well as accurate dimensions. Conventional density: 19g/cm³~19.2g/cm³; Special