Molybdenum Niobium Sputtering Target
Customized Molybdenum-Niobium Alloy Sputtering Target For Vacuum Coating Deposition
Description
Molybdenum-niobium targets produced by Achemetal Tungsten & Molybdenum Co., Ltd. include molybdenum-niobium plane targets and molybdenum-niobium rotating targets.
Features of targets manufactured by Achemetal
1. High product density, good product compactness and uniform crystal grains;
2. Higher machining property;
3. Relative density of targets: over 99%, relative density of alloy: over 97%; grain size: less than 50um;
thermal resistance of films: below 5%; welded rate with back plates: over 98%, film uniformity after target film formation: over 95%;
Conventional density: 9.3g/cm³~9.5 g/cm³;
| Molybdenum-niobium Target Parameters | ||
| Element | MoNb | |
| Composition ratio | Mo-10.0at%Nb | |
| (Nb=10.0±1at%) | ||
| Purity | >99.95%(3N5) | |
| Typical sample dimension | Rotate Φ151×Φ135×750mm；Plane 210×112×10mm | |
| Density | >9.3--9.5g/cm3(sintering),9.7--9.9g/cm3(HIP) | |
| Hardness | HV5:170-210 | |
| Grain Size | 46μm | |
| Appearance | Ra≤0.4μm | |
| Impurity Content (powder) |
Fe | ≤80ppm |
| Ni | ≤20ppm | |
| Cu | ≤30ppm | |
| Al | ≤30ppm | |
| Si | ≤40ppm | |
| O | ≤800ppm | |
| C | ≤100ppm | |
Note: all the specifications can meet the requirements of customers on high accuracy through machining.
Chemical Composition
| Chemistry % | |||||||||||||
| Designation | Chief component | Impurities maximum | |||||||||||
| Nb | Fe | Si | Ni | W | Mo | Ti | Ta | O | C | H | N | ||
| Nb1 | Remainder | 0.004 | 0.003 | 0.002 | 0.004 | 0.004 | 0.002 | 0.07 | 0.015 | 0.004 | 0.0015 | 0.002 | |
| Nb2 | Remainder | 0.02 | 0.02 | 0.005 | 0.02 | 0.02 | 0.005 | 0.15 | 0.03 | 0.01 | 0.0015 | 0.01 | |
Mechanical requirements (annealed condition)
| Grade | Tensile strength δbpsi (MPa), ≥ | Yield strength δ0.2, psi (MPa),≥ | Elongation in 1"/2" gage length, %, ≥ |
|
RO4200-1 RO4210-2 |
18000 (125) | 12000 (85) | 25 |
Our molybdenum-niobium targets are mainly applied to:
Thin-film solar industry, touch control industry, glass industry, semiconductor industry, optical coating industry.
1. Molybdenum sputtering targets are widely used in manufacturing LCD and touch screens;
2. They are also used for solar cells and solar water heating;
3. Conductive glass, STN / TN / TFT-LCD, optical glass, ion plating also adopt it as material;
4. Molybdenum sputtering target also applies to all planes' coating and spin coating system;
5. Adopting physical vacuum deposition technologies (PVD methods),
sputtering targets made from high-grade molybdenum are used for thin films and functional coatings in the production of solar batteries and integral circuits.
Package and Inspection:
We offer material composition sheet and examination report which include density, flaw detection, dimensions and so on.
Our products are packed in plywood case with expanded plastic and water-proffed.
Notice:Sputtering is a proven technology, which is capable of depositing thin films from a wide variety of materials into diverse substrate shapes and sizes.
Get in Touch
Have questions about our products or want to discuss a custom order? Our team is ready to help you.