Molybdenum Tantalum Flat Metal Sputtering Targets ISO14001 Certified
Product Detail
Product Description
Features of targets manufactured by Achemetal
1. Due to the adoption of a hot isostatic pressing process, the product features high density, good compactness and uniform crystal grains;
2. Higher machining property;
3. Relative density of targets: over 99%, relative density of alloy: over 97%; grain size: less than 50um; thermal resistance of films: below 5%; welded rate with back plates: over 98%, film uniformity after target film formation: over 95%.
Specification
| Molybdenum-tantalum Target Parameters | |
| Element | MoTa |
| Composition ratio | Mo |
| Ta 6.0at% | |
| Purity | >99.95% |
| Dimension | 1130mm×1200mmX10mm |
| Density | 10.2--10.5g/cm3 |
| Hardness | HV5:205--240 |
| Grain Size | 48μm |
| Appearance | Ra≤0.4μm |
Note: all the specifications can meet the requirements of customers on high accuracy through machining.
Product information
| Molybdenum-tantalum Target | |||||
| Fe | Ni | C | Al | O | N |
| 0.004 | 0.002 | 0.0028 | 0.0005 | 0.005 | 0.002 |
| Si | Ca | Mg | Cd | Sb | Sn |
| 0.0013 | < 0.001 | < 0.0005 | < 0.001 | < 0.0005 | < 0.0005 |
| P | Cu | Pb | Bi | Mo | |
| < 0.001 | < 0.0005 | < 0.0005 | < 0.0005 | >99.95% | |
Production Process
Application
Molybdenum-tantalum targets of our company are mainly applied to:
Semiconductor industry.
Packing & Delivery
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