Large Scale 115m³/h ultra pure water equipment for Semiconductor with EDI module

I. Product Introduction

• ASTM (American Society for Testing and Materials)
• GB/T 11446.1-2013 (Chinese Electronic Grade Water Standards: 18MΩ·cm, 15MΩ·cm, 10MΩ·cm, 2MΩ·cm, 0.5MΩ·cm)
• Semiconductor Equipment and Materials International (SEMI) Standards
• Integrated Circuit (IC) Manufacturing Specifications

II. Process and Specifications  of   HJ-UPWSe115T

• Multi-Stage Pretreatment: Removes particles, organics, and chlorine to protect RO membranes.
• Dual RO System: Achieves  salt rejection rate for consistent high-purity water.
• EDI Technology: Continuous electro-deionization eliminates the need for chemical regeneration.
• Polishing Resin: Final purification stage for ultralow TOC and ionic contaminants

III. Specifications 

EDI  Photo:

RO Photo:

Details  of  other  process  equipment:

IV. Design Advantages

1. Fully Automated Control:
   • Automatic backwash and regeneration cycles.
   • Manual override option for maintenance.
2. Factory-Integrated Wiring:
   • Pre-wired components reduce on-site installation time .
3. Advanced Maintenance Features:
   • RO chemical cleaning system extends membrane life.
   • Recirculation loops ensure water quality stability.
4. Premium Materials:
   • 304 stainless steel and UPVC piping for corrosion resistance.
5. Intuitive Operation:
   • Integrated control panel with real-time monitoring.
   • Remote access option for troubleshooting.
6. Low Maintenance:
   • Durable components designed for continuous operation.