I.Overview
Ultra-pure water plays an indispensable and critically important role in the lithography process. Lithography is one of the most core steps in semiconductor manufacturing, and lithography-grade ultra-pure water serves as the foundational guarantee for the continued evolution of “Moore's Law,” with requirements for cleanliness and chemical purity reach to an almost stringent extent. Ultra-pure water (UPW), with its extremely low impurity content, is the ideal medium to meet these stringent requirements. Its ultimate purity is the fundamental guarantee for ensuring precise, defect-free lithography patterns and high yield rates.

II.Process
Raw water → Multi-stage filtration → Reverse osmosis (RO) → Electrodeionization (EDI) → UV-ozone synergistic oxidation → Membrane degassing → Dual-stage mixed-bed polishing → Terminal filtration → Nitrogen-sealed water tank

III.Parameters

IV.Application Scenarios
Wafer Cleaning
Post-Development Washing
Dilution and Preparation of Photoresist/Chemicals
Equipment and Component Cleaning

V.Here is a guideline for you to get a proper quotation
Tell us the raw water/source of water(tap water, well water, or sea water, etc)
Provide water analysis report(TDS , conductivity, or resistivity, etc)
Required production capacity( 5m³/H, 50m³/H,or 500m³/H, etc)
What's the pure water used for( industrial,Food and Beverage,or agriculture, etc )