Sapphire Wafer

The CVD Silicon Carbide (SiC) Ring is a semiconductor-grade plasma-resistant component designed for advanced etching, deposition, and plasma processing systems. Manufactured using high-purity Chemical Vapor Deposition (CVD) Silicon Carbide technology, the ring delivers exceptional resistance to plasma erosion, corrosive process gases, and thermal degradation in demanding semiconductor manufacturing environments. SiC rings are widely used as focus rings, edge rings, chamber

4inch Silicon carbide wafer's Product description: Our 4 inch N-Type Silicon Carbide Epitaxial Wafer is engineered for high-performance optoelectronics, harsh-environment sensing, and advanced material research. This 4-inch (101mm) substrate features a 350 µm thickness, which is one of the industry-standard sizes, offering superior mechanical stability for complex microfabrication. The 4H-SiC dominates power electronics, the majority of china market has been replaced with

2inch A-axis orientation sapphire wafer for epi-ready test ,sapphire optical windows, m-axis,c-axis, R-axis 2inch sapphire epi-ready​ substrate 1. Description Sapphire is one of the hardest materials, and possesses very good transmission during the range of visible and near IR spectrum.It is widely used as optical window in infrared and far infrared military equipments, apparatus and instruments of satellite and space technology, and navigation and spaceflight, such as night

ultrathin sapphire glass wafer ,2inch 0.1mm thickness sapphire wafer, 10x10x0.1mmt sapphire substrates, orientation dia50.8x0.1mmt sapphire wafers We can supply professional customized service in time and provide cooperation and support of new product development and technology appliance. 2inch 0.1mm thickness sapphire wafer specification Material: Single crystal Al2O3 99.999％ Orientation: C-plane(0001) Off M -axis 0.2°±0.1 Diameter:50.80±0.2mm Thickness :100±15um (80um also

dia150mm 6inch single side polished sapphire substrates forled ,C-plane,A-aixs R-plane 6inch Al2O3 crystal wafer,6inch C-axis double side polished sapphire wafer for led epi-ready,sapphire substrates, Al2O3 crystal optical lens About Sapphire Feature Product name led sapphire wafer sapphire optical lens chemical formula Al2O3 Crystal structure Hexagonal Hardness Mohs 9H Compressvise strength Gpa 2.0 Density(20℃) 3.98g/cm Fusion point 2040℃ Boiling point 2980℃ Coefficient of

Product Description 4-Inch C-Plane SSP Sapphire Wafer for GaN / III-Nitride Epitaxy Overview We produce 5N (99.999%) Purity monocrystalline Al₂O₃ for advanced semiconductor, optoelectronic, and optical applications. These substrates are polished on a single side for excellent surface smoothness (Ra ≤ 0.2 nm). These substrates offer exceptional thermal stability (>1500 °C), high optical transmittance (~86–89% at 550 nm), and tight thickness uniformity (TTV ≤20 µm). They are

Diamond-Aluminum Thermal Composite – Lightweight, High Thermal Conductivity & Low CTE Product Introduction The Diamond-Aluminum Thermal Conductive Composite is a high-performance thermal management material that combines the exceptionally high thermal conductivity of diamond with a lightweight and rigid aluminum matrix. This composite offers an excellent balance of high heat dissipation efficiency, low density, low coefficient of thermal expansion (CTE), and strong mechanical

Diamond-Copper Thermal Composite – High Conductivity, Adjustable CTE & Excellent Stability Product Overview The Diamond-Copper Thermal Conductive Composite is an advanced material fabricated through PVD batch processing of diamond powders. It combines high thermal conductivity, adjustable coefficient of thermal expansion (CTE), high mechanical strength, and reliable thermal stability, making it ideal for power electronics, semiconductors, lasers, and high-performance

Ultra-Large Square Sapphire Substrate 310 × 310 × 1 mm for Semiconductor & Aerospace Applications Product Overview The 310 × 310 × 1 mm Ultra-Large Square Sapphire Substrate represents the upper limit of current synthetic sapphire crystal growth and large-area precision machining technology. Manufactured from 99.99% high-purity single-crystal aluminum oxide (Al₂O₃), this sapphire plate delivers exceptional flatness, thermal stability, chemical resistance, and mechanical

2-Inch C-Plane Sapphire Substrate for Process Development & Equipment Calibration Product Overview This 2-inch C-plane sapphire substrate is manufactured from high-purity single-crystal aluminum oxide (Al₂O₃) using advanced crystal growth and precision slicing techniques. Featuring a Single-Side Polished (SSP) surface, stable thickness, and low bow control, this substrate is ideal for equipment calibration, thin-film deposition trials, and non-critical semiconductor or

2-inch DSP Sapphire Wafer 200 µm Al₂O₃ for LED & Optical Applications Product Overview Our 2-inch Double Side Polished (DSP) sapphire wafers are precision-engineered from high-purity monocrystalline aluminum oxide (Al₂O₃). With ultra-flat, epi-ready surfaces and minimal bow, these wafers are ideal for GaN epitaxial growth, high-precision optics, semiconductor devices, and camera applications. Product Highlights & Specifications Parameter Specification Material High-purity

4-inch C-Plane SSP Sapphire Substrate Al₂O₃ for LED & Optical Applications Overview Our 4-inch C-plane SSP (Single Side Polished) sapphire substrates are high-purity, monocrystalline Al₂O₃ wafers designed for advanced semiconductor, optoelectronic, and optical applications. With exceptional mechanical strength, thermal stability, and optical transparency, these wafers are ideal for epitaxial growth of GaN, AlN, and other III-V or II-VI compounds used in LEDs, laser diodes,

Sapphire Square Raw Wafer Blank for Optical, Semiconductor, and High-Temperature Applications Product Overview Sapphire square raw wafer blanks are semi-finished single-crystal sapphire plates sliced directly from oriented sapphire boules. These blanks retain an as-cut, unpolished surface with natural saw marks and roughness, making them ideal for downstream precision processing including grinding, lapping, CMP polishing, thinning, and special-shape machining. The material is

Single Crystal Sapphire Substrates (2", 3", 4", and 6") for LED, Optical, and Semiconductor Applications Product Overview ZMSH offers high-quality single crystal sapphire substrates available in 2-inch, 3-inch, 4-inch, and 6-inch diameters, manufactured from 99.99% pure Al₂O₃ (aluminum oxide) using advanced crystal growth and polishing technology. These sapphire wafers feature superior hardness, chemical stability, thermal conductivity, and optical transparency, making them

Single Crystal Sapphire Ingot Al₂O₃ KY CZ 80kg 200kg 400kg for Industrial & Optical Applications Product Overview ZMSH offers high-purity single crystal sapphire ingots , meticulously manufactured using advanced Kyropoulos (KY) and Czochralski (CZ) growth techniques. These ingots are made from ultra-pure aluminum oxide (Al₂O₃) crystals and feature a hexagonal crystal structure with excellent uniformity and minimal impurities. Their superior mechanical, optical, and thermal

Sapphire Substrate (DSP) Overview The Double Side Polished Sapphire Substrate (DSP) is fabricated from high-purity (>99.99%) single crystal aluminum oxide (Al₂O₃). With both sides precision polished to atomic-level smoothness (Ra < 0.3 nm), this material offers excellent optical transparency, mechanical strength, and thermal stability. It is widely used in optical windows, laser components, semiconductor epitaxy, and scientific research applications. Sapphire Substrate (DSP)

Single Crystal Square Sapphire Substrate (C-plane, SSP)10x10 mm Single Side Polished Square Sapphire Substrate (SSP) Product Description The Square Sapphire Substrate (SSP) is made from high-purity (>99.99%) single crystal Al₂O₃, offering excellent mechanical strength, thermal stability, and optical transparency. With C-plane (0001) orientation and single-side polished (SSP) surface, it is ideal for epitaxial growth, GaN-based LED production, optical components, and high

​​Sapphire Wafer Product Introduction​​ ​​Sapphire Wafer Precision Cutting Diameter 60mm Thickness 3mm Optical Infrared Window​​ Sapphire wafer is a precision optical component fabricated from high-purity aluminum oxide (Al₂O₃) single-crystal material, with specifications of 60mm in diameter and 3mm in thickness. It achieves high-precision dimensional control through directional cutting techniques (e.g., laser cutting or diamond wire sawing), with surface roughness controlled

Product introduction of sapphire capillary tube Sapphire Capillary Tube Al₂O₃ Single Crystal Corrosion-Resistant Sapphire Capillary Tubes are made from high-purity Al₂O₃ single crystal, offering with extreme hardness (Mohs 9, second only to diamond), high-temperature resistance (melting point 2050°C), superior corrosion resistance,excellent optical transmission (UV to IR spectrum), outstanding mechanical strength. These properties make them ideal for high-end precision