Titanium Target

High Purity Titanium Sputtering Target ASTM B348 This high purity titanium sputtering target is produced from Grade 1, Grade 2, Grade 5, Grade 7 and Grade 12 titanium with a titanium content of 99.5% minimum and impurity content below 0.04%. Targets are forged and CNC machined to ASTM B348 and ASTM B381 with a density of 4.51 or 4.50 g/cm3, and alloy targets such as Ti-Al, Ti-Cr and Ti-Zr as well as chrome, zirconium, copper and tungsten can also be supplied. Technical

High quality Pure Gr1 Gr2 titanium disc sputtering target for Chemcial industrial 1.Product Details Grade: Gr1 Gr2 Gr5 Titanium ,TiAl, TiCr, TiCu,TiSi,Mo,Cr etc. As customers' requests Size: 60/65/70/80/85/90/95/100(D)/200/300/400×20/30/32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering vacuum coating industry Chemical Requirements N C H Fe O Al V Pa Mo Ni Ti Gr 1 0.03 0.08 0.015 0.20 0.18 / / / / / bal Gr 2 0.03 0

ASTM B381 gr2 gr5 gr9 gr12 titanium target Dia 3' 4' chemical industry 1. Product Information Product name ASTM B381 gr2 gr5 gr9 gr12 titanium target Dia 3' 4' chemical industry Grade Gr1/Gr2/Gr5/Gr7/Gr9/Gr12 Origin Baoji city Shaanxi Province china shape Round target / plate target / tube target Titanium content ≥99.6 (%) Impurity content

Dia 2' 3' 4' Astm B381 Titanium target Pure Ti Coating Sputtering material 1. Product Information Product name Dia 2' 3' 4' Astm B381 Titanium target Pure Ti Coating Sputtering material Grade Gr1/Gr2 Origin baoji city Shaanxi Province china shape Round target / plate target / tube target Titanium content ≥99.6 (%) Impurity content

high quality pure titanium Gr1 Gr2 titanium disc sputtering target The target material is the target material bombarded by high-speed charged particles. There are metals, alloys, oxides, etc. Replace different target materials (such as aluminum, copper, stainless steel, titanium, nickel targets, etc.), you can get different film systems (such as super-hard, wear-resistant, anti-corrosion alloy film, etc.). (1) Metal targets: nickel target, Ni, titanium target, Ti, zinc target

high quality ASTM B39 99.95% NB1 NB2 Evaporation coating niobium target 1.Evaporation coating niobium target Grade: R04200, R04210 Specifications: according to customer requirements Purity: ≥99.95%, 99.99% Standard: ASTM B39 State: Hard state, soft state Niobium target technology: cold rolling, pickling, shearing application: 1)Superconducting industry 2)For the production of niobium foil 3)Heat shield in high temperature furnace 4)Used to produce niobium welded pipe 5)Used

99.95% purity Ta Sputtering target sheet for semiconductor coatings and optical coatings 1. Uses: mainly used in semiconductor coatings and optical coatings. Purity: 99.95% -99.99%. Specification: square target, thickness x width x length = 5 ～ 25x≤800x≤2000 (mm) Grain size: Recrystallization degree ≥98%, average grain size 100μm or

Titanium Sputtering Target for PVD Coating This titanium sputtering target is made from titanium metal and used to deposit titanium films by sputtering. It is produced by vacuum melting and casting, or by powder metallurgy with isostatic pressing and high-temperature sintering, in grades Gr1, Gr2, Gr5, Gr7 and Gr12 as well as alloy targets such as Ti-Al, Ti-Cr and Ti-Zr. The targets are forged and CNC machined with a density of 4.51 g/cm3 and a titanium content of 99.5% min,

TiAl Sputtering Target Disc 35mm-550mm Thickness Our TiAl titanium alloy sputtering target disc is made from Gr2 and Gr5 titanium for physical vapor deposition (PVD) processes. A sputtering target is the material struck by energetic ions so that atoms are ejected and deposited as a thin film onto a substrate; titanium targets are widely used to deposit thin titanium films in electronics, optics and medical devices. Titanium’s high chemical stability, biocompatibility and

TiAl Titanium Aluminum Alloy Sputtering Target This titanium aluminum alloy (TiAl) sputtering target is a lightweight PVD material with high purity, fine and uniform particle size and good formability. It is produced in several Ti/Al composition ratios and supplied in round shape with a polished surface, hot isostatically pressed and checked by ultrasonic testing. TiAl targets are mainly used to deposit hard, wear-resistant and biocompatible coatings for medical instruments,

GR2 GR5 Pure Titanium Target Coating Industries Titanium Alloy Ti6Al4V high quality titanium target GR2 GR5 titanium alloy Ti6Al4V The word "target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal tit

Gr1 Gr2 Gr5 TiAl Alloy Titanium Sputtering Target For PVD Coating Gr1 Gr2 Gr5 TiAl titanium alloy Titanium Sputtering Target For PVD coating ​1.The target material The target material is the target material bombarded by high-speed charged particles. There are metals, alloys, oxides, etc. Replace different target materials (such as aluminum, copper, stainless steel, titanium, nickel targets, etc.), you can get different film systems (such as super-hard, wear-resistant, anti

99.99% High Purity Titanium Sputtering Targets factory for pvd coating machine 1. High purity titanium sputtering targets Product name Titanium Sputtering Targets for pvd coating machine Grade Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc Other materials:chrome,zirconium,copper ,tungsten etc. Origin Baoji city, Shaanxi Province,hina Titanium content ≥99.5 (%) Impurity content

Titanium Sputtering Ti Grade 1 Grade 2 Silver Sputtering Target Titanium Target Sputtering to Coating Sputtering is a widely used deposition technique for creating thin films and coatings on various substrates. In this process, material from a sputtering target (usually in the form of a metal or alloy) is bombarded with high-energy ions in a vacuum, causing atoms to be ejected and deposit onto a surface. This results in the formation of a thin, uniform coating. For different

Titanium Grade 2 Grade 5 Sputtering Target Titanium Target Silver Target Sputtering to Coating Sputtering is a widely used deposition technique for creating thin films and coatings on various substrates. In this process, material from a sputtering target (usually in the form of a metal or alloy) is bombarded with high-energy ions in a vacuum, causing atoms to be ejected and deposit onto a surface. This results in the formation of a thin, uniform coating. For different

tio2 Sputtering Target Titanium Target Silver Titanium Disc Target Sputtering to Medical Applications In medical applications, high-performance materials are required to meet strict demands for biocompatibility, corrosion resistance, and mechanical properties. Titanium and titanium alloys (such as Grade 2, Grade 5, and Grade 7), when combined with aluminum, form alloys that are widely used in sputtering targets for the deposition of high-purity thin films. These thin films

Titanium Target Silver Sputtering Target Titanium Disc to High Purity Sputtering in Medical Applications In the realm of Physical Vapor Deposition (PVD) processes, titanium sputtering targets are critical in the production of thin films used in various medical applications. These thin films are crucial for enhancing the performance, durability, and biocompatibility of medical devices such as implants, stents, prosthetics, and surgical tools. Among the various titanium grades,

Metal Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine Product Details: Grade: Gr1 Gr2 Gr5 Titanium ,TiAl, TiCr, TiCu,TiSi,Mo,Cr etc. As customers' requests Size: 60/65/70/80/85/90/95/100(D)/200/300/400×20/30/32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering vacuum coating industry Chemical Requirements: N C H Fe O Al V Pa Mo Ni Ti Gr 1 0.03 0.08 0.015 0.20

Ti Titanium Sputtering Target High Purity Titanium Sputtering Targets For PVD Vacuum Coating Machine In the realm of advanced materials, titanium sputtering targets are pivotal in the production of high-performance coatings used in various applications, from aerospace to medical devices. Among these, the titanium alloys Gr1, Gr2, and Gr5, as well as TiAl (Titanium-Aluminum) alloys, have emerged as essential components for Physical Vapor Deposition (PVD) coatings. These

Sputtering Target Silver Sputtering Target Titanium Disc to High Purity Sputtering in Medical Applications In the realm of Physical Vapor Deposition (PVD) processes, titanium sputtering targets are critical in the production of thin films used in various medical applications. These thin films are crucial for enhancing the performance, durability, and biocompatibility of medical devices such as implants, stents, prosthetics, and surgical tools. Among the various titanium