Photomask Substrate

152mm × 152mm Quartz Photomask Substrate For FPD Use Applications The fields of photolithography process, such as integrated circuit chip manufacturing, FPD (Flat Panel Display), MEMS (Micro Electro Mechanical Systems), etc. Working Principle Mask is a graphic master mask commonly used in photolithography of micro-nano fabrication. The graphic structure is formed on a transparent substrate by an opaque photomask, and then the graphic information is transferred to the product

350mm × 300mm Quartz Photomask Substrate For FPD Use Applications The fields of photolithography process, such as integrated circuit chip manufacturing, FPD (Flat Panel Display), MEMS (Micro Electro Mechanical Systems), etc. Working Principle Mask is a graphic master mask commonly used in photolithography of micro-nano fabrication. The graphic structure is formed on a transparent substrate by an opaque photomask, and then the graphic information is transferred to the product

Quartz Photomask Substrate For FPD and Chip Use Application Area The fields of photolithography process, such as integrated circuit chip manufacturing, FPD (Flat Panel Display), MEMS (Micro Electro Mechanical Systems), etc. Working Principle Mask is a graphic master mask commonly used in photolithography of micro-nano fabrication. The graphic structure is formed on a transparent substrate by an opaque photomask, and then the graphic information is transferred to the product

127mm × 127mm Quartz Photomask Substrate For FPD Use Applications The fields of photolithography process, such as integrated circuit chip manufacturing, FPD (Flat Panel Display), MEMS (Micro Electro Mechanical Systems), etc. Working Principle Mask is a graphic master mask commonly used in photolithography of micro-nano fabrication. The graphic structure is formed on a transparent substrate by an opaque photomask, and then the graphic information is transferred to the product

800mm×520mm Quartz Photomask Substrate For FPD Use Applications The fields of photolithography process, such as integrated circuit chip manufacturing, FPD (Flat Panel Display), MEMS (Micro Electro Mechanical Systems), etc. Working Principle Mask is a graphic master mask commonly used in photolithography of micro-nano fabrication. The graphic structure is formed on a transparent substrate by an opaque photomask, and then the graphic information is transferred to the product

6 inches × 6 inches × 0.12 inches Quartz Photomask Substrate For Chip Use Applications The fields of photolithography process, such as integrated circuit chip manufacturing, FPD (Flat Panel Display), MEMS (Micro Electro Mechanical Systems), etc. Working Principle Mask is a graphic master mask commonly used in photolithography of micro-nano fabrication. The graphic structure is formed on a transparent substrate by an opaque photomask, and then the graphic information is

6 inches × 6inches × 0.25 inches Quartz Photomask Substrate For Chip Use Applications The fields of photolithography process, such as integrated circuit chip manufacturing, FPD (Flat Panel Display), MEMS (Micro Electro Mechanical Systems), etc. Working Principle Mask is a graphic master mask commonly used in photolithography of micro-nano fabrication. The graphic structure is formed on a transparent substrate by an opaque photomask, and then the graphic information is

5 inches × 5 inches × 0.09 inches Quartz Photomask Substrate For Chip Use Applications The fields of photolithography process, such as integrated circuit chip manufacturing, FPD (Flat Panel Display), MEMS (Micro Electro Mechanical Systems), etc. Working Principle Mask is a graphic master mask commonly used in photolithography of micro-nano fabrication. The graphic structure is formed on a transparent substrate by an opaque photomask, and then the graphic information is