Photomask Substrate
152mm 152mm Quartz Photomask Substrate for FPD Micro Nano Fabrication
Precision 152x152mm quartz photomask substrate for FPD, MEMS, and IC lithography. Features chrome plating, photoresist coating, and ISO-certified manufacturing. Customizable processing ensures high durability and efficiency. Ideal for micro-nano fabrication.
350x300mm Quartz Photomask Substrate for IC Chip Manufacturing FPD Use
High-precision 350x300mm quartz photomask substrate for IC, FPD, and MEMS lithography. Features chrome plating and photoresist coating. ISO certified with mature manufacturing process and 24-hour response.
Quartz Photomask Substrate 800x520mm for FPD and Chip Grinding Polishing
High-precision quartz photomask substrate for FPD and chip photolithography. Features grinding, polishing, chrome plating, and gluing. ISO certified with mature process and 24-hour response. Custom sizes available.
127x127mm Quartz Photomask Substrate for Flat Panel Display FPD Use
High-precision 127x127mm quartz photomask substrate for FPD, IC, and MEMS lithography. Features chrome plating, photoresist coating, and ISO certification. Custom processing available with 24-hour response.
Quartz Photomask Substrate 800mm x 520mm for FPD Grinding Polishing Chrome Plating
High-precision 800mm x 520mm quartz photomask substrate for FPD and MEMS photolithography. Features grinding, polishing, chrome plating, and gluing. ISO certified, direct manufacturer with mature process and 24-hour response.
6x6x0.12 Inch Quartz Photomask Substrate Chrome Plated Photoresist Coated for MEMS IC
Precision 6x6x0.12 inch quartz photomask substrate with chrome plating and photoresist coating. Ideal for MEMS, IC, and FPD lithography. ISO certified, manufacturer direct, mature process, 24hr response.
6x6x0.25 Inch Quartz Photomask Substrate for Photolithography Chip Manufacturing
Precision 6x6x0.25 inch quartz photomask substrate for photolithography in IC, FPD, and MEMS fabrication. Features chrome plating, photoresist coating, and ISO-certified quality. Direct manufacturer with mature process and 24-hour support.
Quartz Photomask Substrate 5x5x0.09 Inches for MEMS and IC Chip Manufacturing
Precision 5x5x0.09 inch quartz photomask substrate for MEMS, IC, and FPD photolithography. Features chrome plating and photoresist coating. ISO certified, direct manufacturer with mature process and fast response.