Optical Coating Equipment
PVD Magnetron Sputter Deposition Machine for Dielectric Films Optical Coating 700mm Chamber
Customizable PVD sputter coater for dielectric films, metals, and oxides. Features 700x750x700mm chamber, ≤±0.5% uniformity, and 500°C heating. Ideal for semiconductor, display, and optical applications. ISO certified with global support.
ALD1200-500 Atomic Layer Deposition Coating Equipment 1200mm Chamber Customizable
Self-developed ALD system with 1200mm inner diameter chamber, customizable height. Deposits AL2O3, TiO2, ZnO films at up to 500°C. Achieves
Trimethylaluminum ALD Coating Machine for Al2O3 TiO2 ZnO Deposition 1200mm Chamber
Precision atomic layer deposition system for Al2O3, TiO2, ZnO films. Features 1200mm customizable chamber, 500°C max temperature, ±0.1nm thickness control, and ≤±0.5% uniformity. Ideal for MEMS, solar, and semiconductor applications. ISO certified, manufacturer direct.
Dielectric Films Magnetron Sputtering PVD Coating Machine 700mm Chamber 500°C
This PVD magnetron sputtering system deposits dielectric, metal, and oxide films with high precision. Features a 700mm chamber, temperature up to 500°C, and thickness uniformity ≤±0.5%. Ideal for semiconductors, optics, and medical coatings. Customizable and ISO certified.
PVD Magnetron Sputtering Deposition Equipment for Dielectric Films 700mm Chamber 500°C
This PVD magnetron sputtering system deposits dielectric, metal, and oxide films with high precision. Features a 700mm chamber, temperature up to 500°C, and thickness uniformity ≤±0.5%. PLC controlled with customizable options. Ideal for semiconductor, display, and optical applications.
PVD Magnetron Sputtering Coating Machine for Metal Film Metal Oxide AIN 700mm Chamber
This PVD sputtering system deposits metal, oxide, and AIN films with high precision. Features a 700mm chamber, temperature up to 500°C, and ≤±0.5% uniformity. Ideal for semiconductor, optical, and decorative coatings. Customizable and ISO certified.
ALD Al2O3 Optical Coating Equipment 200×200mm Coating Size 500°C
Atomic layer deposition system for precise thin-film coatings. Features customizable chamber up to 1200mm, ±0.1nm thickness control, and ≤±0.5% uniformity. Ideal for MEMS, optics, and solar applications. ISO certified with 24-hour response.
TiO2 Al2O3 Optical Coating ALD Deposition Equipment 1200mm 500°C ISO
Precision atomic layer deposition system for uniform TiO2, Al2O3, and ZnO films. Features customizable chamber up to 1200mm, thickness control ±0.1nm, and ≤±0.5% uniformity. Ideal for MEMS, optics, and solar cells. ISO certified with 24h support.
TiO2 Al2O3 ALD Atomic Layer Deposition Optical Coating Equipment 1200mm 500C
Precision ALD system for uniform TiO2, Al2O3, ZnO films. Features customizable chamber up to 1200mm, 500°C temp range, ±0.1nm thickness control. Ideal for MEMS, optics, solar cells. ISO certified, direct manufacturer support.