Magnetron Sputtering Coating Machine

Magnetron Sputtering Deposition in Anti-discoloration Coating Field Applications Applications Specific Purpose Material Type Anti-discoloration coating Precious metal anti-oxidation coating Al2O3, TiO2 Working Principle Electrons continuously collide with argon atoms in the motion process,ionizing a large number of argon ions to bombard the target. After multiple collisions, the energy of electrons gradually decreases.Electrons break away from the restriction of magnetic line

Magnetron Sputtering Deposition in Decorative Coating Field Applications Applications Specific Purpose Material Type Decorative coating Colored film, Metallized film Al2O3, TiO2, and all kinds of metal films Working Principle Magnetron sputtering is to increase sputtering rate by introducing a magnetic field on the target surface and using the magnetic field to constrain the charged particles to increase the plasma density. Features Model MSC-DC-X—X Coating type Various

Magnetron Sputtering Deposition in Semiconductor Industry Applications Applications Specific Purpose Material Type Semiconductor IC, LSI electrode, wiring film AI, Al-Si, Al-Si-Cu, Cu, Au, Pt, Pd, Ag VLSI memory electrode Mo, W, Ti Diffusion barrier film MoSix, Wsix, TaSix,, TiSx, W, Mo, W-Ti Adhesive film PZT(Pb-ZrO2-Ti) , Ti, W Working Principle Magnetron sputtering principle: under the action of electric field, electrons collide with argon atoms in the process of flying to

Magnetron Sputtering Deposition in Medical Treatment Industry Applications Applications Specific Purpose Material Type Medical treatment Biocompatible materials Al2O3, TiO2 Working Principle The basic principle of magnetron sputtering is that electrons collide with argon atoms in the process of flying to the substrate under the action of electric field, the produced argon ions bombard target surface. After the energy exchange, the atoms on the target surface escape from the

Magnetron Sputtering Deposition in Functional Film Field Applications Applications Specific Purpose Material Type Functional film Superhard film TiN, TiC Lightproof film Cr, AlSi, AlTi,etc Resistive film NiCrSi, CrSi, MoTa, etc Superconducting film YbaCuO, BiSrCaCuo Magnetic film Fe, Co, Ni, FeMn, FeNi, etc Working Principle There are many kinds of magnetron sputtering with different working principles and application objects. But there is one thing in common: it makes the

Magnetron Sputtering Deposition in Perovskite Thin-film Battery Industry Applications Applications Specific Purpose Material Type Perovskite thin-film battery Transparent conducting layer ZnO:Al Working Principle Magnetron sputtering is to constrain and extend the motion paths of electron by magnetic field, change the motion directions of electron, increase the ionization rate of working gas and effectively use the energy of electrons. Magnetron sputtering has the following

Magnetron Sputtering Deposition in Optical recording Industry Applications Applications Specific Purpose Material Type Optical recording Phase change disc recording film TeSe, SbSe, TeGeSb, etc Magnetic disk recording film TbFeCo, DyFeCo, TbGdFeCo, TbDyFeCo Optical disc reflective film AI, AITi, AlCr, Au, Au alloy Optical disc protection film Si3N4, SiO2+ZnS Working Principle The working principle of magnetron sputtering is that electrons collide with argon atoms in the

Magnetron Sputtering Deposition in Display Industry Applications Applications Specific Purpose Material Type Display Transparent conductive film ITO(In2O; -SnO2) Electrode wiring film Mo, W, Cr, Ta, Ti, Al, AlTi, AITa Electroluminescent film ZnS-Mn, ZnS-Tb, CaS-Eu, Y2O3, Ta2O5, BaTiO3 Working Principle As a common physical vapor deposition (PVD) method, magnetron sputtering has many advantages such as low deposition temperature, rapid deposition velocity and good uniformity

Magnetron Sputtering Deposition in Optics Industry Applications Applications Specific Purpose Material Type Optics Optical films such as antireflection film, high-low refractive index SiO2, TiO2, Ta2O5, ZrO2, HfO2 Low-emission glass Multiple layers of metal (silver, copper, tin, etc.) or other compounds Transparent conducting glass ZnO:Al, etc Working Principle The features of magnetron sputtering are high film-forming rate, low substrate temperature, good film adhesion and

Magnetron Sputtering Deposition in Magnetic Recording Industry Applications Applications Specific Purpose Material Type Magnetic recording Vertical magnetic recording film CoCr Film for hard disk CoCrTa, CoCrPt, CoCrTaPt Thin film magnetic head CoTaZr, CoCrZr Artificial crystal film CoPt, CoPd Working Principle Magnetron sputtering is to form an orthogonal EM field above the cathode target surface. After the secondary electrons generated from sputtering are accelerated to be