Magnetron Sputtering Coating Machine

This magnetron sputtering coating machine is designed for anti-discoloration coatings using Al2O3 and TiO2. Features a customizable 700mm vacuum chamber, temperature control up to 500°C, and high precision thickness control. Ideal for precious metal anti-oxidation applications. ISO certified.

High-efficiency magnetron sputtering system for decorative colored and metallized films. Features customizable 700mm vacuum chamber, precise thickness control ≤±3%, and planetary rotation for uniform coating. Supports Al2O3, TiO2, and metal films. ISO certified with 24-hour support.

Customizable magnetron sputtering system for semiconductor IC, LSI electrode and wiring film deposition. Supports metal, oxide, and AIN coatings up to 500°C with ±3% thickness precision. ISO certified, manufacturer direct, 24h response.

Precision magnetron sputtering system for biocompatible Al2O3 and TiO2 coatings in medical treatment. Features customizable 700mm vacuum chamber, 500°C max temperature, and ≤±3% thickness control. ISO certified with mature process and 24-hour support.

Precision magnetron sputtering system for superhard, optical, resistive, and magnetic films. Features customizable 700mm vacuum chamber, ≤±3% thickness control, and planetary rotation. Supports DC, RF, pulse, and IF power. ISO certified with mature process and 24-hour response.

Magnetron sputter coater for dielectric films in perovskite battery production. Features 700mm customizable chamber, ≤±0.5% uniformity, and 500°C coating. Supports DC/RF/pulse power. ISO certified with mature process and 24h support.

Precision magnetron sputtering system for optical recording films. Features customizable 700mm vacuum chamber, ≤±3% thickness control, and ≤±0.5% uniformity. Supports metal, oxide, and nitride coatings up to 500°C. Ideal for phase change discs, magnetic films, and reflective layers. ISO certified with OEM options.

High-precision ITO sputter coater for display electrodes and transparent conductive films. Features customizable 700mm chamber, ≤±3% thickness control, and ≤±0.5% uniformity. Supports DC/RF/pulse power and planetary rotation. ISO certified with 24h support.

High-precision magnetron sputtering system for optical coatings like HfO2, SiO2, TiO2. Features customizable 700mm chamber, ≤±3% thickness control, and ≤±0.5% uniformity. Supports DC/RF sputtering with planetary rotation. ISO certified, direct manufacturer support.

Designed for magnetic recording films like CoCr, CoCrPt, and CoCrTaPt. Features a customizable 700mm vacuum chamber, coating up to 500°C, thickness ≥10nm with ±3% precision, and ≤±0.5% uniformity. ISO certified with mature process and 24h support.