Atomic Layer Deposition Equipment

Atomic Layer Deposition in Energy Industry Applications Applications Specific Purpose Energy Crystalline silicon solar cells: passivation layer / buffer layer / transparent electrode Dye-sensitized cells: photo-anode / charge recombination barrier layer Fuel cells: proton exchange membrane / cathode / electrolyte / catalyst Lithium ion battery: nanostructure anode / cathode / electrode modified coating Thermoelectric materials Electrode material protection layer Working

Atomic Layer Deposition in Micro Electro Mechanical Systems Industry Applications Applications Specific Purpose Micro Electro Mechanical Systems (MEMS) Anti-wear coating Anti-adhesion coating Lubricating coating Working Principle A single atomic layer will be deposited in each process cycle. The coating process usually occurs in the reaction chamber, and the process gases are injected successively. Alternatively, substrate can be transferred between two zones filled with

Atomic Layer Deposition in Sensor Industry Applications Applications Specific Purpose Sensor Gas sensor Humidity sensor Biosensor Working Principle A basic atomic layer deposition cycle consists of four steps: 1. The first precursor will be guided to the substrate surface, and the chemisorption process will automatically terminate when the surface is saturated; 2. Inert gases Ar or N2 and by-products, flush the excess first precursor away; 3. The second precursor is injected

Atomic Layer Deposition in Magnetic Head Industry Applications Applications Specific Purpose Magnetic head Non-planar deposition insulating spacing layer Working Principle Atomic layer deposition technology is that makes the precursors which will be involved in the reaction guided to the reaction chamber sequentially (one precursor at a time) through different precursor conduits. By means of saturation chemisorption on the surface of substrate, only one layer of precursor is

Atomic Layer Deposition in Protective Coating Field Applications Applications Specific Purpose Protective coating Corrosion-resistant coating Seal coating Working PrincipleIn a traditional CVD process, the gas-phase precursors will continuously or at least partially react. In the ALD process, however, the reactions only occur on the substrate surface. It is a cyclic process consisting of multiplepartial reactions, that is, the substrate contacts with precursors in sequence

Atomic Layer Deposition in Separation Membrane field Applications Applications Specific Purpose Separation membrane Filtration Gas separation Working Principle Atomic layer deposition (ALD) has the following advantages due to the surface saturation chemisorption and self-limiting reaction mechanism: 1. Accurately control the film thickness by controlling the cycle numbers; 2. Due to the mechanism of surface saturation, there is no need to control the uniformity of precursor

Atomic Layer Deposition in Organic Electronic Packaging Industry Applications Applications Specific Purpose Organic electronic packaging Packaging of organic light-emitting diode (OLED), etc. Working Principle The advantage of atomic layer deposition technology is that, because the surface reaction of ALD technology is self-limiting, materials of the desired precise thickness can be made by repeating this self-limitation constantly. This technology has good step coverage and

Atomic Layer Deposition in Nanostructure and Pattern Industry Applications Applications Specific Purpose Nanostructure and pattern Template-assisted nanostructure Catalyst-assisted nanostructure Regioselective ALD for nanopattern preparation Working Principle Atomic layer deposition is a method of forming film by making the gaseous phase precursors pulsed alternately into the reaction chamber and producing the gas-solid phase chemisorption reaction on the deposited substrate

Atomic Layer Deposition in Optics Industry Applications Applications Specific Purpose Optics Optical components Photonic crystal Electroluminescent display Surface-enhanced Raman spectroscopy Transparent conductive oxide Luminous layer, passivation layer, filter protection layer, anti-reflective coating, anti-UV coating Working PrincipleAtomic layer deposition (ALD), originally called atomic layer epitaxy, also called atomic layer chemical vapor deposition (ALCVD), is a

Atomic Layer Deposition in Catalyst Industry Applications Applications Specific Purpose Catalyst Oxide catalyst Metal catalyst Working Principle Atomic layer deposition (ALD) technology, also known as atomic layer epitaxy (ALE) technology, is a chemical vapor film deposition technology based on ordered and surface self-saturated reaction. ALD is applied in semiconductor field. As Moore’s Law evolves constantly and the feature sizes and etching grooves of integrated circuits

Atomic Layer Deposition in Semiconductor Industry Applications Applications Specific Purpose Semiconductor Logic device (MOSFET), High-K gate dielectrics / gate electrode High-K capacitive material / capacitive electrode of Dynamic Random Access Memory (DRAM) Metal interconnection layer, metal passivation layer, metal seed crystal layer, metal diffusion barrier layer Non-volatile memory:flash memory, phase change memory, resistive random access memory, ferroelectric memory,