Self-developed high-end optical coating equipment with 1200mm*500mm(customized)
Price:
Negotiable
MOQ:
1
Delivery Time:
Delivery within 8 months after signing the contract
Brand:
Zeit Group
Product Description
Self-developed high-end optical coating equipment with 1200mm*500mm(customized)
Working principle
Atomiclayer deposition (ALD) is a method by which a substance can be deposited on a substrate layer by layer in the form of a single atomic film.
Specification parameter
| model | ALD1200-500 |
| Coating film system | AL2O3,TiO2,ZnO and etc. |
| Coating temperature range | Normal temperature-500℃ |
| Coating vacuum chamber dimensions | Inner diameter 1200mm, height 500mm(customizable) |
| Vacuum chamber structure | Customized according to customer needs |
| Background vacuum | <5X10-7mbar |
| Coating thickness | ≥0.15nm |
| Thickness control accuracy | ±0.Inm |
Application Area
| MEMS device |
| Electroluminescent plate |
| display |
| Storage material |
| Inductive coupling |
| Perovskite thin film battery |
| 3D packaging |
| Luminescence application |
| sensor |
| Carp battery |
ALD technology Advantages
①The precursor is saturated chemisorption, which ensures the formation of a large area uniform film.
②Multi-component nanosheets and mixed oxides can be deposited.
③Inherent deposition uniformity, easy scaling, can be directly scaled up.
④Can be widely applied to various shapes of the base.
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Get in Touch
Have questions about our products or want to discuss a custom order? Our team is ready to help you.
Company
ZEIT Group
Location
CSCES strait screen and core intelligent manufacturing base，Shuangliu District，Chengdu City, Sichuan Province, P. R. China
Contact Person
Tyra