Grinding Polishing Quartz Photomask Substrate For FPD And Chip Use
Quartz Photomask Substrate For FPD and Chip Use
Application Area
The fields of photolithography process, such as integrated circuit chip manufacturing, FPD (Flat Panel Display),
MEMS (Micro Electro Mechanical Systems), etc.
Working Principle
Mask is a graphic master mask commonly used in photolithography of micro-nano fabrication. The graphic structure
is formed on a transparent substrate by an opaque photomask, and then the graphic information is transferred to the
product substrate through an exposure process.
Features
Photomask Substrate for FPD use
| Model / Material | Size | Processing Capacity |
| 5280 / Quartz | 800mm × 520mm | Grinding, Polishing, Chrome Plating, Gluing |
| 3035 / Quartz | 350mm × 300mm | Grinding, Polishing, Chrome Plating, Gluing |
| 6 inches / Quartz | 152mm × 152mm | Grinding, Polishing, Chrome Plating, Gluing |
| 5 inches / Quartz | 127mm × 127mm | Grinding, Polishing, Chrome Plating, Gluing |
Photomask Substrate for Chip use
| Model / Material | Size | Processing Capacity |
| 5009 / Quartz | 5 inches × 5 inches × 0.09 inches | Grinding, Polishing, Chrome Plating, Gluing |
| 6012 / Quartz | 6 inches × 6 inches × 0.12 inches | Grinding, Polishing, Chrome Plating, Gluing |
| 6025 / Quartz | 6 inches × 6inches × 0.25 inches | Grinding, Polishing, Chrome Plating, Gluing |
Process Flow
→ Raw materials detection
→ Rough grinding
→ Rough polishing
→ Mask cleaning
→ Raw materials performance inspection
→ Plated by chrome
→ Mask performance testing
→ Photoresist coating
→ Packaging
→ Transporting
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